Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | XBP1 | P17861 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22279612 | 0.78 | KDM4E (0.59) | ELANEKDM4ETDP1ALDH1A1 | |
| SCHEMBL25948397 | 0.73 | ELANE (0.36) | ELANEKDM4ELMNAALOX15GAA | |
| SCHEMBL22279610 | 0.72 | CA12 (0.35) | ELANEKDM4EALDH1A1ALOX15GAA | |
| SCHEMBL14270896 | 0.71 | ALOX15 (0.46) | ELANEKDM4EALDH1A1ALOX15GAA | |
| SCHEMBL23870908 | 0.69 | ELANE (0.47) | ELANEKDM4ELMNATDP1ALDH1A1 | |
| SCHEMBL21276510 | 0.69 | ELANE (0.53) | ELANELMNATDP1ALDH1A1ALOX15 | |
| SCHEMBL22279461 | 0.68 | KMT2A (0.56) | ELANEALDH1A1 | |
| SCHEMBL23870906 | 0.68 | CYP3A4 (0.47) | LMNAALDH1A1 | |
| SCHEMBL22279462 | 0.68 | ALDH1A1 (0.49) | KDM4EALDH1A1 | |
| SCHEMBL22279456 | 0.68 | ALDH1A1 (0.49) | ELANEKDM4ELMNAALDH1A1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210048746-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-18 | — | — | US | disclosed |