SCHEMBL5035248

SCHEMBL5035248

C=CC(=O)OCC(O)COC(=O)c1ccccc1C(=O)OCC(O)COC(=O)C=C

nearest known ligand 0.53

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.53
ALDH1A1 P00352 4/20 0.53
CYP3A4 P08684 2/20 0.53
ADRB2 P07550 11/20 0.50
ADRB1 P08588 11/20 0.50
ADRB3 P13945 11/20 0.50
THRB P10828 1/20 0.44
CA2 P00918 1/20 0.43
HSD17B10 Q99714 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29829102 0.94 ALDH1A1 (0.49) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL21603040 0.94 ALDH1A1 (0.49) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL27993932 0.93 ADRB2 (0.51) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL21699774 0.93 TSHR (0.54) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL22667593 0.92 TSHR (0.53) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL11230610 0.91 ADRB2 (0.56) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL24191167 0.89 TSHR (0.47) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL23837240 0.89 TSHR (0.43) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL35053 0.88 ALDH1A1 (0.47) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL13374673 0.87 ADRB2 (0.60) TSHRALDH1A1CYP3A4ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119916643-A Photosensitive resin composition, photosensitive dry film, cured film and circuit board 杭州福斯特电子材料有限公司 2025-05-02 CN claimed
CN-122080692-A Radiation curable inkjet ink composition and recording method 2026-05-26 CN disclosed
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT RESONAC CORPORATION (JP) 2026-02-12 US disclosed
EP-4692160-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, ADHESIVE, AND ADHESIVE SHEET Mitsubishi Chemical Corporation (JP) 2026-02-11 EP disclosed
US-20260028491-A1 Radiation Curable Ink Jet Composition And Ink Jet Method SEIKO EPSON CORP (JP) 2026-01-29 US disclosed
US-20260015527-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, ADHESIVE, AND ADHESIVE SHEET MITSUBISHI CHEMICAL CORPORATION (JP) 2026-01-15 US disclosed
EP-4667537-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-12-24 EP disclosed
US-20250382500-A1 PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE TOKYO OHKA KOGYO CO LTD (JP) 2025-12-18 US disclosed
US-12480011-B2 Radiation curable ink jet composition and ink jet method SEIKO EPSON CORPORATION (JP) 2025-11-25 US disclosed
US-20250333548-A1 COMPOSITION AND PHOTOSENSITIVE COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2025-10-30 US disclosed
US-20100247940-A1 Optical resin composition, optical resin material using the same, optical filter for image display device, and image display device HITACHI CHEMICAL CO., LTD. (JP) 2010-09-30 US disclosed
US-20100233627-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD, AND METHOD FOR PRODUCING SUBSTRATE FOR PLASMA DISPLAY PANEL HITACHI CHEMICAL CO., LTD. (JP) 2010-09-16 US disclosed
US-20100233627-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PRINTED WIRING BOARD, AND METHOD FOR PRODUCING SUBSTRATE FOR PLASMA DISPLAY PANEL HITACHI CHEMICAL CO., LTD. (JP) 2010-09-16 US disclosed
US-20090191373-A1 Single Layer Film and Hydrophilic Material Comprising the Same MITSUI CHEMICALS ,INC. 2009-07-30 US disclosed
US-20090191373-A1 Single Layer Film and Hydrophilic Material Comprising the Same MITSUI CHEMICALS ,INC. 2009-07-30 US disclosed
US-20080262179-A1 Gas-Barrier Film, Gas-Barrier Layered Body, And Process For Producing Same TOHCELLO CO., LTD. (JP) 2008-10-23 US disclosed
EP-1955782-A1 SINGLE LAYER FILM AND HYDROPHILIC MATERIAL COMPOSED OF SAME Mitsui Chemicals, Inc. (JP) 2008-08-13 EP disclosed
EP-1754726-A1 GAS-BARRIER FILM, GAS-BARRIER LAYERED PRODUCT, AND PROCESS FOR PRODUCING THE SAME Tohcello Co., Ltd. (JP) 2007-02-21 EP disclosed
US-6890701-B2 Negative working lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 2005-05-10 US disclosed
US-20030129524-A1 Negative working lithography printing plates FUJI PHOTO FILM CO., LTD. 2003-07-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260015527-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION, ADHESIVE, AND ADHESIVE SHEET CDH1, COL1A1, EPCAM TSHR 2914/4885ALDH1A1 308/4885CYP3A4 4449/4885
US-20260044080-A1 COPOLYMER, PHOTOSENSITIVE RESIN COMPOSITION, RESIN CURED FILM, AND IMAGE DISPLAY ELEMENT KDM2B, KDM1A, KDM3A TSHR 4567/4885ALDH1A1 166/4885CYP3A4 294/4885
US-20260028491-A1 Radiation Curable Ink Jet Composition And Ink Jet Method MATK, PEAK1, FLNA TSHR 4583/4885ALDH1A1 1953/4885CYP3A4 2064/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.