⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22373262 | 0.87 | — | — | |
| SCHEMBL22372741 | 0.87 | CCR2 (0.33) | — | |
| SCHEMBL22373034 | 0.86 | — | — | |
| SCHEMBL22372735 | 0.86 | ITGB3 (0.30) | — | |
| SCHEMBL22373023 | 0.83 | GABRP (0.33) | — | |
| SCHEMBL22372988 | 0.83 | — | — | |
| SCHEMBL22372964 | 0.83 | SIGMAR1 (0.34) | — | |
| SCHEMBL22373392 | 0.82 | PLAT (0.31) | — | |
| SCHEMBL22372969 | 0.82 | CCR2 (0.32) | — | |
| SCHEMBL22372736 | 0.81 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20200272049-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-27 | — | — | US | disclosed |