SCHEMBL22374189

SCHEMBL22374189

CC(C)(OC(=O)c1cccc(Oc2ccccc2)c1)C1CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.47
AKR1C3 P42330 1/20 0.47
PKM P14618 1/20 0.45
HDAC8 Q9BY41 1/20 0.43
RAB9A P51151 3/20 0.42
POLB P06746 1/20 0.42
CYP2C9 P11712 1/20 0.42
TPSAB1 Q15661 1/20 0.41
TPSD1 Q9BZJ3 1/20 0.41
TPSG1 Q9NRR2 1/20 0.41
ERCC5 P28715 1/20 0.40
FEN1 P39748 1/20 0.40
PARP14 Q460N5 1/20 0.39
PARP10 Q53GL7 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CHRM3 P20309 1/20 0.39
KDM2B Q8NHM5 3/20 0.39
MEN1 O00255 2/20 0.39
MAPT P10636 2/20 0.39
KMT2A Q03164 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22374191 0.89 CHRNB2 (0.42) NPC1RAB9ATPSAB1TPSD1TPSG1
SCHEMBL22373379 0.88 ESR1 (0.48) SMN1; SMN2MEN1KMT2A
SCHEMBL22373531 0.87 ITGB3 (0.40) MEN1KMT2A
SCHEMBL22373159 0.86 MGLL (0.40) NPC1RAB9APOLBCYP2C9PARP14
SCHEMBL22372789 0.86 TSHR (0.46) MEN1MAPTKMT2A
SCHEMBL22372876 0.85 MAPT (0.42) HDAC8MEN1MAPTKMT2A
SCHEMBL22372743 0.83 FYN (0.39) NPC1PKMCYP2C9SMN1; SMN2CHRM3
SCHEMBL22373108 0.83 HTR2C (0.42) NPC1HDAC8RAB9APOLBSMN1; SMN2
SCHEMBL22373188 0.83 P4HB (0.42) NPC1RAB9A
SCHEMBL26785375 0.82 ESR1 (0.38) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20200272048-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR NPC1 4818/4885AKR1C3 3695/4885PKM 4263/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.