SCHEMBL22373370

SCHEMBL22373370

COc1ccc(C(=O)OC(C)(C)C2CCNCC2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.50
CA1 P00915 4/20 0.46
CA2 P00918 4/20 0.46
ALDH1A1 P00352 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
CHRNB2 P17787 2/20 0.42
CHRNB4 P30926 2/20 0.42
CHRNA3 P32297 2/20 0.42
CHRNA7 P36544 2/20 0.42
CHRNA4 P43681 2/20 0.42
TDP1 Q9NUW8 1/20 0.41
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
HPGDS O60760 1/20 0.40
MAPT P10636 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22373044 0.91 MEN1 (0.41) ELANECA1CA2ALDH1A1SMN1; SMN2
SCHEMBL22372982 0.89 HPGDS (0.49) ALDH1A1SMN1; SMN2NPC1RAB9AHPGDS
SCHEMBL22372838 0.86 MEN1 (0.40) ALDH1A1SMN1; SMN2HPGDSKDM4EMEN1
SCHEMBL22372811 0.86 MEN1 (0.38) ALDH1A1SMN1; SMN2NPC1RAB9AMAPT
SCHEMBL22373124 0.86 KMT2A (0.51) ALDH1A1SMN1; SMN2NPC1RAB9ATDP1
SCHEMBL22373194 0.86 CA12 (0.42) ELANECA1CA2ALDH1A1SMN1; SMN2
SCHEMBL26478419 0.86 SMN1; SMN2 (0.40) ALDH1A1SMN1; SMN2NPC1RAB9AMAPT
SCHEMBL22374191 0.85 CHRNB2 (0.42) ALDH1A1SMN1; SMN2NPC1RAB9ACHRNB2
SCHEMBL22373063 0.84 ALDH1A1 (0.40) ALDH1A1CHRNB2CHRNA7CHRNA4MEN1
SCHEMBL22372809 0.84 GPR119 (0.39) CA1CA2ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20200272049-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ELANE 3291/4885CA1 1910/4885CA2 472/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.