SCHEMBL2237469

SCHEMBL2237469

C=C(C)C(=O)Oc1[c]cccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.46
KMT2A Q03164 2/20 0.40
ATM Q13315 2/20 0.40
ALDH1A1 P00352 4/20 0.34
KDM4E B2RXH2 2/20 0.33
TDP1 Q9NUW8 2/20 0.31
MAPT P10636 2/20 0.30
BACE1 P56817 1/20 0.30
HPGD P15428 2/20 0.30
ESR1 P03372 1/20 0.30
ITGB3 P05106 1/20 0.30
ITGA2B P08514 1/20 0.30
HMGB1 P09429 1/20 0.30
TSHR P16473 1/20 0.30
GGT1 P19440 1/20 0.30
PTGS1 P23219 1/20 0.30
PTGS2 P35354 1/20 0.30
BLM P54132 1/20 0.30
NAPRT Q6XQN6 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL131380 0.81 KDM4E (0.41) ELANEALDH1A1KDM4ETDP1MAPT
SCHEMBL5032141 0.78 THRB (0.42) ELANEALDH1A1KDM4ETDP1MAPT
SCHEMBL7244110 0.76 ELANE (0.37) ELANEKMT2AATMALDH1A1MAPT
SCHEMBL8639565 0.76 ELANE (0.44) ELANEKMT2AATMALDH1A1TDP1
SCHEMBL7261346 0.75 L3MBTL1 (0.35) KMT2AATMALDH1A1TDP1MAPT
SCHEMBL28824339 0.75 GPR174 (0.33) ELANEALDH1A1KDM4E
SCHEMBL8445626 0.75 HPGD (0.33) ELANEHPGD
SCHEMBL1232932 0.74 ELANE (0.56) ELANEKMT2AATMALDH1A1KDM4E
SCHEMBL30803748 0.74 ELANE (0.56) ELANEKMT2AATMALDH1A1KDM4E
SCHEMBL30803750 0.74 ELANE (0.56) ELANEKMT2AATMALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111495344-B Photoresponse type molecularly imprinted polymer based on magnetic mesoporous silicon nanoparticles, preparation method and application 江苏大学 2023-02-17 CN claimed
CN-111495344-A Photoresponse type molecularly imprinted polymer based on magnetic mesoporous silicon nanoparticles, preparation method and application 江苏大学 2020-08-07 CN claimed
US-9557443-B2 Photosensitive resin composition, black matrix, color filter, and liquid crystal display device CHI MEI CORPORATION (TW) 2017-01-31 US claimed
US-20140374675-A1 PHOTOSENSITIVE RESIN COMPOSITION, BLACK MATRIX, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY DEVICE CHI MEI CORPORATION (TW) 2014-12-25 US claimed
EP-0619346-B1 Lacquered tris-or tetracationic polymethin dyes BASF AG (DE) 1998-06-24 EP claimed
JP-2023069669-A RESIN COMPOSITION INCLUDING CURABLE COMPOUND 日本化薬株式会社 2023-05-18 JP disclosed
CN-115957729-A Preparation method of photoresponse sulfadimidine magnetic material 江苏大学 2023-04-14 CN disclosed
CN-111495344-B Photoresponse type molecularly imprinted polymer based on magnetic mesoporous silicon nanoparticles, preparation method and application 江苏大学 2023-02-17 CN disclosed
CN-108744040-B Preparation method of high-molecular biological material with abrasion self-repairing function in-vivo environment 西南交通大学 2021-03-16 CN disclosed
CN-111495344-A Photoresponse type molecularly imprinted polymer based on magnetic mesoporous silicon nanoparticles, preparation method and application 江苏大学 2020-08-07 CN disclosed
CN-109206387-A Reactive liquid crystalline original, liquid-crystal composition and the liquid crystal display device comprising it 东进世美肯株式会社 2019-01-15 CN disclosed
CN-104238266-B Photosensitive resin composition, black matrix, color filter and liquid crystal display 奇美实业股份有限公司 2018-03-27 CN disclosed
CN-100369969-C Oil-proof thermoplastic elastic body composition and moulded goods using said composition JSR CORP (JP) 2008-02-20 CN disclosed
US-20070287070-A1 Electrode for Polymer Electrolyte Secondary Battery and Polymer Electrolyte Secondary Battery NOF CORPORATION (JP) 2007-12-13 US disclosed
EP-1837360-A1 VINYL-URETHANE COPOLYMER AND METHOD FOR PRODUCING SAME Konishi Co., Ltd. (JP) 2007-09-26 EP disclosed
US-20070117902-A1 Vinyl-urethane copolymers and production methods thereof KONISHI CO., LTD. (JP) 2007-05-24 US disclosed
US-6632585-B1 Copolymer of partially deuterated and/or halogenated vinyl siloxanes; heat, water and chemical resistance; high transmission at communication wavelength ranges NIPPON SHEET GLASS CO., LTD. (JP) 2003-10-14 US disclosed
CN-1412231-A Oil-proof thermoplastic elastic body composition and moulded goods using said composition JSR CORP (JP) 2003-04-23 CN disclosed
CN-1337013-A Photosensitive composition, and optical waveguide element and process for producing the same NIPPON SHEET GLASS CO LTD (JP) 2002-02-20 CN disclosed
EP-1154323-A1 PHOTOSENSITIVE COMPOSITION, AND OPTICAL WAVEGUIDE ELEMENT AND PROCESS FOR PRODUCING THE SAME Nippon Sheet Glass Co., Ltd. (JP) 2001-11-14 EP disclosed