SCHEMBL224555

SCHEMBL224555

CCN(CC)c1ccc(N[C]=O)cc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.55
MEN1 O00255 4/20 0.53
KMT2A Q03164 4/20 0.53
RAB9A P51151 4/20 0.53
NPC1 O15118 4/20 0.53
NOX1 Q9Y5S8 3/20 0.53
ALDH1A1 P00352 6/20 0.50
GAA P10253 3/20 0.50
MCL1 Q07820 2/20 0.50
POLB P06746 1/20 0.50
ALDH3A1 P30838 1/20 0.50
ALDH1A3 P47895 1/20 0.50
MAPK1 P28482 5/20 0.48
TSHR P16473 4/20 0.48
GFER P55789 2/20 0.48
PSMD14 O00487 1/20 0.48
CYP3A4 P08684 1/20 0.48
RECQL P46063 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11532086 0.82 MAPT (0.50) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL7664793 0.78 ADRA2A (0.58) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL7789704 0.76 MEN1 (0.32) MEN1KMT2ATDP1LMNA
SCHEMBL1735497 0.76 ALDH1A1 (0.74) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL8816989 0.76 HDAC6 (0.49) MAPTMEN1KMT2AALDH1A1TSHR
SCHEMBL6141824 0.76 MAPT (0.55) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL222552 0.76 ALDH1A1 (0.52) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL11729511 0.75 MAPT (0.54) MAPTMEN1KMT2ARAB9ANPC1
SCHEMBL8401340 0.75 HRH3 (0.53) HDAC8HDAC6CNR2
SCHEMBL2322679 0.74 GBA1 (0.50) MAPTMEN1KMT2ARAB9ANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8637220-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-01-28 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed