Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | NPFFR1 | Q9GZQ6 | 1/20 | 0.31 |
| ▸ | NPFFR2 | Q9Y5X5 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL702221 | 0.85 | GLA (0.40) | ALDH1A1EPHX1GLAMEN1KMT2A | |
| SCHEMBL7125894 | 0.85 | GLA (0.40) | ALDH1A1EPHX1GLAMEN1KMT2A | |
| SCHEMBL15348321 | 0.82 | NAAA (0.36) | ALDH1A1EPHX1GLATHRBCYP2C9 | |
| SCHEMBL14973423 | 0.81 | EPHX2 (0.35) | ALDH1A1EPHX1EPHX2 | |
| SCHEMBL25401545 | 0.81 | LMNA (0.43) | ALDH1A1CYP2C9MEN1KMT2AEPHX2 | |
| SCHEMBL157720 | 0.79 | THRB (0.39) | ALDH1A1EPHX1GLATHRBCYP2C9 | |
| SCHEMBL757168 | 0.79 | THRB (0.39) | ALDH1A1EPHX1GLATHRBCYP2C9 | |
| SCHEMBL3828264 | 0.78 | ALDH1A1 (0.36) | ALDH1A1GLATHRBMEN1KMT2A | |
| SCHEMBL562688 | 0.77 | THRB (0.38) | ALDH1A1EPHX1GLATHRBCYP2C9 | |
| SCHEMBL4084702 | 0.77 | NPFFR1 (0.40) | ALDH1A1EPHX1THRBCYP2C9EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8491965-B2 | Method of controlling orientation of domains in block copolymer films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-23 | — | — | US | claimed |
| US-20090181171-A1 | Method of Controlling Orientation of Domains in Block Copolymer Films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | claimed |
| US-8491965-B2 | Method of controlling orientation of domains in block copolymer films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-23 | — | — | US | disclosed |
| US-7989026-B2 | Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-02 | — | — | US | disclosed |
| US-7763319-B2 | Coating a substrated with a solution of both a styrene-methyl methacrylate block polymer and a homo- or copolymer of epoxycyclopentadienyl (meth)acrylate that has an affinity for the substrate that is greater than that of the block polymer and baking; the polymers segregate into layers; etching | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-07-27 | — | — | US | disclosed |
| US-20090181171-A1 | Method of Controlling Orientation of Domains in Block Copolymer Films | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | disclosed |
| US-20090182093-A1 | Coating a substrated with a solution of both a styrene-methyl methacrylate block polymer and a homo- or copolymer of epoxycyclopentadienyl (meth)acrylate that has an affinity for the substrate that is greater than that of the block polymer and baking; the polymers segregate into layers; etching | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | disclosed |
| US-20090179001-A1 | METHOD OF USE OF EPOXY-CONTAINING CYCLOALIPHATIC ACRYLIC POLYMERS AS ORIENTATION CONTROL LAYERS FOR BLOCK COPOLYMER THIN FILMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | disclosed |
| US-7189491-B2 | Photoresist composition for deep UV and process thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-03-13 | — | — | US | disclosed |
| EP-1709485-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ Electronic Materials USA Corp. (US) | 2006-10-11 | — | — | EP | disclosed |
| WO-2005059652-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-30 | — | — | WO | disclosed |
| US-20050130058-A1 | Photoresist composition for deep UV and process thereof | MERCK PATENT GMBH (DE) | 2005-06-16 | — | — | US | disclosed |