Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CNR2 | P34972 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL702221 | 1.00 | GLA (0.40) | GLAALDH1A1EPHX1EPHX2MEN1 | |
| SCHEMBL2250804 | 0.85 | ALDH1A1 (0.33) | GLAALDH1A1EPHX1EPHX2MEN1 | |
| SCHEMBL701445 | 0.85 | PKM (0.36) | GLAALDH1A1EPHX1TSHRCNR2 | |
| SCHEMBL6905424 | 0.82 | — | — | |
| SCHEMBL15348321 | 0.82 | NAAA (0.36) | GLAALDH1A1EPHX1EPHX2MEN1 | |
| SCHEMBL3828264 | 0.82 | ALDH1A1 (0.36) | GLAALDH1A1EPHX2MEN1KMT2A | |
| SCHEMBL25401545 | 0.81 | LMNA (0.43) | ALDH1A1EPHX2MEN1KMT2ACNR2 | |
| SCHEMBL14973423 | 0.81 | EPHX2 (0.35) | ALDH1A1EPHX1EPHX2TSHR | |
| SCHEMBL157720 | 0.79 | THRB (0.39) | GLAALDH1A1EPHX1EPHX2 | |
| SCHEMBL757168 | 0.79 | THRB (0.39) | GLAALDH1A1EPHX1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6664022-B1 | Forming relief image on substrate by coating with amplified positive resin and iodinium or sulfonium compound comprising naphthyl, thienyl or pentafluorophenyl substituents; exposure to patterned activating radiation; development | SHIPLEY COMPANY, L.L.C. | 2003-12-16 | — | — | US | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |