SCHEMBL226334

SCHEMBL226334

CCCCN(c1nc(NCCCN(CCN(CCCNc2nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)n2)c2nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)n2)c2nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)nc(N(CCCC)C3CC(C)(C)NC(C)(C)C3)n2)nc(N(CCCC)C2CC(C)(C)NC(C)(C)C2)n1)C1CC(C)(C)NC(C)(C)C1

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC29A1 Q99808 2/20 0.35
CRHR1 P34998 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10801042 0.93 SMN1; SMN2 (0.33) SLC29A1CRHR1SMN1; SMN2
SCHEMBL698299 0.93 SLC29A1 (0.32) SLC29A1
SCHEMBL3136072 0.92 SLC29A1 (0.33) SLC29A1
SCHEMBL19829444 0.91 CRHR1 (0.36) SLC29A1CRHR1
SCHEMBL10167577 0.91 NPY1R (0.33) SLC29A1
SCHEMBL9367814 0.91 DNM2 (0.34)
SCHEMBL10135470 0.90 NPY1R (0.33) SLC29A1
SCHEMBL10135488 0.90 NPY1R (0.33) SLC29A1
SCHEMBL10135468 0.90 NPY1R (0.33) SLC29A1
SCHEMBL9091672 0.90 SLC29A1 (0.35) SLC29A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 917 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4509565-A1 RESIN COMPOSITION, RESIN ADDITIVE COMPOSITION, RESIN STRUCTURE, METHOD FOR IMPROVING WEATHER RESISTANCE, METHOD FOR PRODUCING RESIN COMPOSITION, AND HINDERED AMINE PHOTOSTABILIZER ADEKA CORPORATION (JP) 2025-02-19 EP claimed
EP-3154937-B1 CHLORINE-RESISTANT POLYETHYLENE COMPOUND AND ARTICLES MADE THEREFROM FINA TECHNOLOGY (US) 2024-05-22 EP claimed
WO-2023199980-A1 RESIN COMPOSITION, RESIN ADDITIVE COMPOSITION, RESIN STRUCTURE, METHOD FOR IMPROVING WEATHER RESISTANCE, METHOD FOR PRODUCING RESIN COMPOSITION, AND HINDERED AMINE PHOTOSTABILIZER 株式会社ADEKA 2023-10-19 WO claimed
US-20170089503-A1 Chlorine-resistant Polyethylene Compound and Articles Made Therefrom TOTAL AMERICAN SERVICES, INC. 2017-03-30 US claimed
US-20260139087-A1 COMPOUND, POLYMER, LIGHT STABILIZER COMPOSITION, RESIN COMPOSITION, COATING MATERIAL COMPOSITION, ARTICLE, SEALING MATERIAL, MOLDED ARTICLE, METHOD FOR PRODUCING WEATHER-RESISTANT RESIN COMPOSITION, AND METHOD FOR IMPROVING WEATHER RESISTANCE OF SYNTHETIC RESIN ADEKA CORPORATION (JP) 2026-05-21 US disclosed
EP-4745198-A1 RESIN COMPOSITION, MOLDED ARTICLE, RESIN ADDITIVE COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, METHOD FOR IMPROVING CRYSTALLINITY OF CRYSTALLINE RESIN, AND MATERIAL FOR RESIN ADDITIVE COMPOSITION ADEKA CORPORATION (JP) 2026-05-20 EP disclosed
US-12624265-B2 Antistatic agent, antistatic composition comprising same, antistatic resin composition comprising same, and molded article thereof ADEKA CORPORATION (JP) 2026-05-12 US disclosed
US-12624392-B2 Molecular array generation using photoresist 10X GENOMICS, INC. (US) 2026-05-12 US disclosed
US-20260117044-A1 PHENOLIC COMPOUND, ORGANIC MATERIAL STABILIZER, RESIN COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-04-30 US disclosed
EP-4729581-A1 PLASTICIZER, COMPOSITION, AND MOLDED ARTICLE ADEKA CORPORATION (JP) 2026-04-22 EP disclosed
US-20260103482-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL SUMITOMO CHEMICAL CO (JP) 2026-04-16 US disclosed
EP-4726011-A1 FLAME RETARDANT, COMPOSITION, AND MOLDED ARTICLE ADEKA CORPORATION (JP) 2026-04-15 EP disclosed
EP-0576833-A2 Process for preparing hydrolytically stable trivalent phosphorus compounds and their use as stabilisators for thermoplastic materials HOECHST AKTIENGESELLSCHAFT (DE) 1994-01-05 EP disclosed
EP-0568999-A1 Polyvinylbutyrales having improved thermostability and light stability HOECHST AKTIENGESELLSCHAFT (DE) 1993-11-10 EP disclosed
EP-0534661-A1 Production of thermoplastic resin having high impact resistance SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1993-03-31 EP disclosed
EP-0524640-A1 Diarylphosphinous acid arylesters, process for their preparation and their use to stabilize polymers, in particular polyolefin moulding compositions HOECHST AKTIENGESELLSCHAFT (DE) 1993-01-27 EP disclosed
EP-0451539-A1 Thermoplastic resin composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1991-10-16 EP disclosed
EP-0416321-A1 Crystalline polyolefin composition Chisso Corporation (JP) 1991-03-13 EP disclosed
EP-0309402-A1 N-substituted hindered amine stabilizers CIBA-GEIGY AG (CH) 1989-03-29 EP disclosed
EP-0180992-A2 Stabilizer compositions for synthetic resins imparting improved light stability ADEKA ARGUS CHEMICAL CO., Ltd. (JP) 1986-05-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260117044-A1 PHENOLIC COMPOUND, ORGANIC MATERIAL STABILIZER, RESIN COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL PIEZO1, TERB1, RPA1 SLC29A1 2976/4885CRHR1 3591/4885SMN1; SMN2 1653/4885
US-12624392-B2 Molecular array generation using photoresist POLL, LIG4, LIG3 SLC29A1 3850/4885CRHR1 4241/4885SMN1; SMN2 3258/4885
US-20260139087-A1 COMPOUND, POLYMER, LIGHT STABILIZER COMPOSITION, RESIN COMPOSITION, COATING MATERIAL COMPOSITION, ARTICLE, SEALING MATERIAL, MOLDED ARTICLE, METHOD FOR PRODUCING WEATHER-RESISTANT RESIN COMPOSITION, AND METHOD FOR IMPROVING WEATHER RESISTANCE OF SYNTHETIC RESIN SEM1, RAD51, SUN2 SLC29A1 2503/4885CRHR1 548/4885SMN1; SMN2 948/4885
US-12624265-B2 Antistatic agent, antistatic composition comprising same, antistatic resin composition comprising same, and molded article thereof SORD, SUCLA2, SUCLG1 SLC29A1 4631/4885CRHR1 3628/4885SMN1; SMN2 790/4885
US-20260103482-A1 STABILIZER, ORGANIC MATERIAL COMPOSITION, AND METHOD FOR STABILIZING ORGANIC MATERIAL HNRNPL, APOL1, OR10J3 SLC29A1 4060/4885CRHR1 1380/4885SMN1; SMN2 1683/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.