⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1598871 | 0.82 | — | — | |
| SCHEMBL17240321 | 0.81 | — | — | |
| SCHEMBL2774703 | 0.79 | — | — | |
| SCHEMBL28157806 | 0.76 | THRB (0.42) | — | |
| SCHEMBL779460 | 0.74 | — | — | |
| SCHEMBL8893283 | 0.74 | — | — | |
| SCHEMBL779461 | 0.73 | ALDH1A1 (0.32) | — | |
| SCHEMBL177879 | 0.73 | LMNA (0.35) | — | |
| SCHEMBL49357 | 0.72 | — | — | |
| SCHEMBL29256187 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4711518-A1 | COATED FIBERS AND MOLDED BODY USING SAME | Kuraray Co., Ltd. (JP) | 2026-03-18 | — | — | EP | disclosed |
| US-12460111-B2 | Reinforcing fibers and production method therefor, and molded article using same | KURARAY CO., LTD. (JP) | 2025-11-04 | — | — | US | disclosed |
| WO-2024237206-A1 | COATED FIBERS AND MOLDED BODY USING SAME | 株式会社クラレ | 2024-11-21 | — | — | WO | disclosed |
| CN-113454282-B | Reinforcing fiber, method for producing same, and molded article using same | 株式会社可乐丽 | 2024-02-13 | — | — | CN | disclosed |
| US-11884788-B2 | Reinforcing fiber, method for manufacturing same, and molded body using same | KURARAY CO., LTD. (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230303808-A1 | EMULSION COMPOSITION AND METHOD FOR PRODUCING SAME | KURARAY CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| EP-4206233-A1 | EMULSION COMPOSITION AND METHOD FOR PRODUCING SAME | Kuraray Co., Ltd. (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-116348499-A | Emulsion composition and method for producing same | 株式会社可乐丽 | 2023-06-27 | — | — | CN | disclosed |
| US-20220049062-A1 | REINFORCING FIBER, METHOD FOR MANUFACTURING SAME, AND MOLDED BODY USING SAME | KURARAY CO., LTD. (JP) | 2022-02-17 | — | — | US | disclosed |
| EP-3933101-A1 | REINFORCING FIBER, METHOD FOR MANUFACTURING SAME, AND MOLDED BODY USING SAME | Kuraray Co., Ltd. (JP) | 2022-01-05 | — | — | EP | disclosed |
| US-20130136897-A1 | RESISTS FOR LITHOGRAPHY | PIXELLIGENT TECHNOLOGIES, LLC (US) | 2013-05-30 | — | — | US | disclosed |
| US-8383316-B2 | Multi-step; reversible; provide exposure quadratically dependant on intensity of light; semiconductors | PIXELLIGENT TECHNOLOGIES, LLC (US) | 2013-02-26 | — | — | US | disclosed |
| US-20120288797-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF USE IN HIGH INDEX IMMERSION LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-15 | — | — | US | disclosed |
| US-8236482-B2 | Photoresist compositions and methods of use in high index immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-07 | — | — | US | disclosed |
| US-8003309-B2 | Photoresist compositions and methods of use in high index immersion lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-23 | — | — | US | disclosed |
| US-20090181321-A1 | Photoresist Compositions and Methods of Use in High Index Immersion Lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | disclosed |
| US-20090181322-A1 | Photoresist Compositions and Methods of Use in High Index Immersion Lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-16 | — | — | US | disclosed |
| EP-2047332-A2 | RESISTS FOR PHOTOLITHOGRAPHY | Pixelligent Technologies LLC, (US) | 2009-04-15 | — | — | EP | disclosed |
| US-20080176166-A1 | RESISTS FOR LITHOGRAPHY | PIXELLIGENT TECHNOLOGIES, LLC | 2008-07-24 | — | — | US | disclosed |
| WO-2008008275-A2 | RESISTS FOR PHOTOLITHOGRAPHY | PIXELLIGENT TECHNOLOGIES LLC (US) | 2008-01-17 | — | — | WO | disclosed |