Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.32 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.30 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2100217 | 0.78 | SIGMAR1 (0.36) | TSHRADRB2ADRB1 | |
| SCHEMBL235044 | 0.77 | TSHR (0.35) | TSHRHTR2ASLC6A4CYP2D6NFKB1 | |
| SCHEMBL2267939 | 0.76 | HTR2A (0.44) | TSHRHTR2ASLC6A4CYP2D6NFKB1 | |
| SCHEMBL68911 | 0.75 | GABRA1 (0.36) | TSHRCYP2D6NFKB1HIF1A | |
| Hydrochloric Acid SCHEMBL5388739 | 0.74 | BLM (0.47) | TSHRHTR2ASLC6A4ADRB2ADRB1 | |
| SCHEMBL2104519 | 0.74 | TSHR (0.39) | TSHRSLC6A4HIF1A | |
| SCHEMBL10318395 | 0.71 | TRPA1 (0.34) | ADRB2ADRB1CYP2D6NFKB1HIF1A | |
| SCHEMBL2100798 | 0.70 | NISCH (0.36) | — | |
| SCHEMBL10717115 | 0.70 | TSHR (0.38) | TSHR | |
| SCHEMBL3378475 | 0.69 | GABRA1 (0.50) | TSHRHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |