Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 3/20 | 0.31 |
| ▸ | GAA | P10253 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | ALPL | P05186 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2103327 | 0.82 | HTT (0.33) | KCNN4TP53SIGMAR1MAPTGAA | |
| SCHEMBL10709653 | 0.81 | SIGMAR1 (0.38) | TP53SIGMAR1NPSR1LMNAMAPT | |
| SCHEMBL6114217 | 0.78 | ACHE (0.38) | TP53MAPTGAAKDM4EHPGD | |
| SCHEMBL2101823 | 0.76 | KCNH2 (0.37) | SIGMAR1NPSR1KCNH2MAPTGAA | |
| SCHEMBL6114613 | 0.76 | ACHE (0.42) | NPSR1LMNAMAPTGAACYP3A4 | |
| SCHEMBL2103221 | 0.72 | PGR (0.35) | KCNH2MAPTHPGDALDH1A1 | |
| SCHEMBL2100308 | 0.72 | TAAR1 (0.35) | SIGMAR1MAPTKDM4ECYP3A4PKM | |
| SCHEMBL2103435 | 0.72 | SIGMAR1 (0.41) | KCNN4TP53SIGMAR1MAPTCYP3A4 | |
| SCHEMBL2269741 | 0.70 | — | — | |
| SCHEMBL2101906 | 0.70 | MAPT (0.33) | MAPTTSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| US-20240158915-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2024-05-16 | — | — | US | claimed |
| EP-4288579-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2023-12-13 | — | — | EP | claimed |
| CN-117083412-A | Composition for atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2023-11-17 | — | — | CN | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| WO-2022197410-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2022-09-22 | — | — | WO | claimed |
| US-8912353-B2 | Organoaminosilane precursors and methods for depositing films comprising same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-12-16 | — | — | US | claimed |
| EP-2392691-B1 | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PROD & CHEM (US) | 2014-09-03 | — | — | EP | claimed |
| US-20120128897-A1 | Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-05-24 | — | — | US | claimed |
| EP-2392691-A1 | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-12-07 | — | — | EP | claimed |
| CN-119213168-A | Boron-containing precursors for ALD deposition of boron nitride films | 弗萨姆材料美国有限责任公司 | 2024-12-27 | — | — | CN | disclosed |
| US-20240158915-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2024-05-16 | — | — | US | disclosed |
| EP-4288579-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | Versum Materials US, LLC (US) | 2023-12-13 | — | — | EP | disclosed |
| CN-117083412-A | Composition for atomic layer deposition of high quality silicon oxide films | 弗萨姆材料美国有限责任公司 | 2023-11-17 | — | — | CN | disclosed |
| WO-2022197410-A1 | COMPOSITION FOR ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2022-09-22 | — | — | WO | disclosed |
| EP-2535343-A2 | Organoaminosilane precursors and methods for making and using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-12-19 | — | — | EP | disclosed |
| US-20120128897-A1 | Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-05-24 | — | — | US | disclosed |
| CN-102295657-A | Organoaminosilane precursors and methods for depositing films comprising the same | — | 2011-12-28 | — | — | CN | disclosed |
| EP-2392691-A1 | Organoaminosilane precursors and methods for depositing films comprising the same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-12-07 | — | — | EP | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120128897-A1 | Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | C1S, C9, C5 | KCNN4 238/4885TP53 3557/4885SIGMAR1 1397/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.