Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | MTOR | P42345 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | GRM7 | Q14831 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6114335 | 0.72 | TDP1 (0.42) | SIGMAR1CYP1A2CYP3A4CYP2D6TSHR | |
| SCHEMBL2269128 | 0.72 | KCNN4 (0.38) | SIGMAR1KCNN4CYP3A4TSHRPKM | |
| SCHEMBL234049 | 0.71 | SIGMAR1 (0.44) | SIGMAR1KCNN4CYP3A4TSHRMTOR | |
| SCHEMBL2103031 | 0.71 | PGR (0.37) | SIGMAR1CYP2D6 | |
| SCHEMBL2099562 | 0.69 | SIGMAR1 (0.42) | SIGMAR1HTTKCNN4CYP3A4TSHR | |
| SCHEMBL2100214 | 0.68 | SIGMAR1 (0.41) | SIGMAR1HTTKCNN4TSHRMTOR | |
| SCHEMBL2101330 | 0.67 | KDM4E (0.32) | — | |
| SCHEMBL2270806 | 0.65 | SIGMAR1 (0.39) | SIGMAR1KCNN4 | |
| SCHEMBL2103176 | 0.65 | SIGMAR1 (0.39) | SIGMAR1HTTKCNN4CYP1A2CYP3A4 | |
| SCHEMBL2103327 | 0.65 | HTT (0.33) | SIGMAR1HTTKCNN4CYP3A4TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |