SCHEMBL2272425

SCHEMBL2272425

CN(C)[SiH2]CCCc1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 7/20 0.52
AOC3 Q16853 2/20 0.52
TAAR1 Q96RJ0 1/20 0.48
CHRM2 P08172 1/20 0.47
HTR1A P08908 1/20 0.47
ADRA2A P08913 1/20 0.47
CHRM1 P11229 1/20 0.47
DRD1 P21728 1/20 0.47
SLC6A2 P23975 1/20 0.47
SLC6A4 P31645 1/20 0.47
ADRA1A P35348 1/20 0.47
OPRM1 P35372 1/20 0.47
DRD3 P35462 1/20 0.47
SLC6A3 Q01959 1/20 0.47
KCNH2 Q12809 1/20 0.47
ALOX5 P09917 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8777945 0.87 TAAR1 (0.52) SIGMAR1AOC3TAAR1
SCHEMBL2271017 0.80 KCNH2 (0.53) SIGMAR1AOC3CHRM2HTR1AADRA2A
SCHEMBL8964010 0.76 L3MBTL1 (0.48) SIGMAR1AOC3CHRM2HTR1AADRA2A
SCHEMBL1882499 0.75 MAOA (0.58) SIGMAR1TAAR1ADRA1ASLC6A3L3MBTL1
SCHEMBL2154293 0.73 TSHR (0.48) SIGMAR1AOC3TAAR1SLC6A2SLC6A4
SCHEMBL8136862 0.72 IDO1 (0.47) SIGMAR1AOC3CHRM2HTR1AADRA2A
SCHEMBL12902332 0.71 SIGMAR1 (0.88) SIGMAR1AOC3TAAR1CHRM2HTR1A
SCHEMBL119103 0.71 SIGMAR1 (0.83) SIGMAR1AOC3TAAR1CHRM2HTR1A
SCHEMBL8766061 0.71 HDAC3 (0.50) SIGMAR1ADRA1ASLC6A3
SCHEMBL8766068 0.71 HDAC3 (0.50) SIGMAR1ADRA1ASLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed