SCHEMBL22737553

SCHEMBL22737553

Cc1ccccc1-c1cc(C(C)(c2ccc(C3CCCCC3)cc2)c2ccc(S)c(-c3ccccc3S)c2)ccc1S

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR1 P21453 4/20 0.42
S1PR5 Q9H228 1/20 0.42
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
PDK2 Q15119 1/20 0.34
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
KIF11 P52732 1/20 0.34
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
XBP1 P17861 1/20 0.33
HTT P42858 1/20 0.33
ACE P12821 1/20 0.31
PGAM1 P18669 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TP53 P04637 1/20 0.31
ATM Q13315 1/20 0.31
TLR9 Q9NR96 1/20 0.30
CCR1 P32246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189675 0.95 CYP3A4 (0.39) S1PR1S1PR5CYP3A4CYP2C9PDK2
SCHEMBL22737899 0.86 CYP3A4 (0.42) S1PR1S1PR5CYP3A4CYP2C9PDK2
SCHEMBL21189677 0.84 CYP3A4 (0.46) S1PR1S1PR5CYP3A4CYP2C9PDK2
SCHEMBL22738047 0.81 ESR1 (0.41) CYP3A4CYP2C9PDK2ESR1ESR2
SCHEMBL21189811 0.79 NPC1 (0.43) ESR1ESR2LMNASMN1; SMN2ALDH1A1
SCHEMBL21189674 0.76 ESR1 (0.47) CYP3A4ESR1ESR2LMNAMAPT
SCHEMBL22737890 0.76 ESR1 (0.36) CYP3A4ESR1ESR2LMNASMN1; SMN2
SCHEMBL21189414 0.75 KIF11 (0.40) S1PR1S1PR5CYP3A4CYP2C9PDK2
SCHEMBL23082034 0.75 ESR1 (0.43) S1PR1S1PR5CYP3A4CYP2C9PDK2
SCHEMBL21189630 0.74 NPC1 (0.40) ESR1ESR2KIF11LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed