SCHEMBL21189675

SCHEMBL21189675

CC(c1ccc(C2CCCCC2)cc1)(c1ccc(S)c(-c2ccccc2S)c1)c1ccc(S)c(-c2ccccc2S)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
S1PR1 P21453 3/20 0.38
S1PR5 Q9H228 1/20 0.38
PDK2 Q15119 1/20 0.37
KIF11 P52732 1/20 0.36
LMNA P02545 2/20 0.33
HTT P42858 2/20 0.33
MAPT P10636 1/20 0.33
XBP1 P17861 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
ACE P12821 1/20 0.33
PGAM1 P18669 1/20 0.33
KMO O15229 1/20 0.32
PTPRC P08575 1/20 0.32
PTPRF P10586 1/20 0.32
PTPN1 P18031 1/20 0.32
CDC25B P30305 1/20 0.32
ALDH1A1 P00352 2/20 0.32
NPC1 O15118 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22737553 0.95 S1PR1 (0.42) CYP3A4CYP2C9S1PR1S1PR5PDK2
SCHEMBL21189677 0.88 CYP3A4 (0.46) CYP3A4CYP2C9S1PR1S1PR5PDK2
SCHEMBL22737899 0.83 CYP3A4 (0.42) CYP3A4CYP2C9S1PR1S1PR5PDK2
SCHEMBL21189811 0.83 NPC1 (0.43) LMNASMN1; SMN2ALDH1A1NPC1PLA2G1B
SCHEMBL21189674 0.80 ESR1 (0.47) CYP3A4LMNAMAPTSMN1; SMN2ALDH1A1
SCHEMBL21189414 0.79 KIF11 (0.40) CYP3A4CYP2C9S1PR1S1PR5PDK2
SCHEMBL23082034 0.79 ESR1 (0.43) CYP3A4CYP2C9S1PR1S1PR5PDK2
SCHEMBL21189630 0.78 NPC1 (0.40) KIF11LMNAHTTMAPTXBP1
SCHEMBL21189421 0.77 CYP3A4 (0.41) CYP3A4CYP2C9KIF11LMNAHTT
SCHEMBL21189635 0.76 ESR1 (0.40) CYP2C9KIF11LMNAHTTMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed