SCHEMBL22876778

SCHEMBL22876778

Cc1cc(C)c(OC(=O)C(C)(CC(C)C)C(C)C)c(C)c1

nearest known ligand 0.35

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 2/20 0.35
▸ GLA P06280 1/20 0.35
▸ AAK1 Q2M2I8 4/20 0.33
▸ MIF P14174 1/20 0.33
▸ MMP8 P22894 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ MCL1 Q07820 1/20 0.32
▸ KDM4E B2RXH2 2/20 0.31
▸ L3MBTL1 Q9Y468 2/20 0.31
▸ ALDH1A1 P00352 2/20 0.31
▸ ELANE P08246 1/20 0.30
▸ TAS1R3 Q7RTX0 1/20 0.30
▸ TAS1R1 Q7RTX1 1/20 0.30
▸ HPGD P15428 1/20 0.30
▸ TSHR P16473 1/20 0.30
▸ AKR1B1 P15121 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25637650 0.75 — —
SCHEMBL14839101 0.73 HMGCR (0.33) ELANE
SCHEMBL10243710 0.73 DGAT1 (0.45) AAK1MMP8MEN1KMT2A
SCHEMBL17068814 0.72 KDM4E (0.38) MAPTGLAMIFMEN1KMT2A
SCHEMBL19954364 0.72 ELANE (0.49) MEN1KMT2AKDM4EALDH1A1ELANE
SCHEMBL26458262 0.72 ELANE (0.31) ELANE
SCHEMBL15935717 0.71 MMP8 (0.37) MMP8
SCHEMBL14838551 0.71 SCN9A (0.41) MAPTALDH1A1TSHR
SCHEMBL16048002 0.71 HPGD (0.33) MEN1KMT2AMCL1KDM4EL3MBTL1
SCHEMBL19901519 0.70 POLB (0.44) GLAMEN1KMT2AALDH1A1ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 — — US disclosed
US-20210011377-A1 PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-01-14 — — US disclosed
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