SCHEMBL2289190

SCHEMBL2289190

C=COCOC(=O)C(=C)CCc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.46
KEAP1 Q14145 1/20 0.43
FFAR1 O14842 3/20 0.41
ALDH1A1 P00352 1/20 0.41
HDAC2 Q92769 2/20 0.39
HDAC8 Q9BY41 2/20 0.39
HDAC6 Q9UBN7 2/20 0.39
GPR52 Q9Y2T5 1/20 0.39
MAPT P10636 2/20 0.38
GAA P10253 1/20 0.38
SLC5A1 P13866 1/20 0.38
SLC5A2 P31639 1/20 0.38
HCAR2 Q8TDS4 1/20 0.38
HDAC1 Q13547 2/20 0.38
HDAC3 O15379 1/20 0.38
MAPK1 P28482 1/20 0.38
ADRA1A P35348 1/20 0.38
HDAC4 P56524 1/20 0.38
SLC6A3 Q01959 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7398418 0.80 TDP1 (0.53) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL14397264 0.78 TDP1 (0.51) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL7299043 0.78 MAPT (0.53) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL1093411 0.78 TDP1 (0.47) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL5704682 0.77 TDP1 (0.54) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL18300374 0.76 KEAP1 (0.50) TDP1KEAP1FFAR1ALDH1A1HDAC2
Acrylic Acid SCHEMBL28070034 0.75 ALDH1A1 (0.46) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL28007941 0.75 TDP1 (0.51) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL3997663 0.74 ALDH1A1 (0.53) TDP1KEAP1FFAR1ALDH1A1HDAC2
SCHEMBL3291001 0.74 KEAP1 (0.52) TDP1KEAP1FFAR1ALDH1A1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3460013-B1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORP (JP) 2020-08-12 EP disclosed
US-10590297-B2 Ink jet composition set and ink jet recording method SEIKO EPSON CORPORATION (JP) 2020-03-17 US disclosed
EP-3470477-A1 RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-04-17 EP disclosed
US-20190092957-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2019-03-28 US disclosed
EP-3460013-A1 INK JET COMPOSITION SET AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-03-27 EP disclosed
US-9925801-B2 Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2018-03-27 US disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9827760-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-11-28 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-20130286095-A1 PRINT APPARATUS AND PRINT METHOD SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
US-20130286121-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-31 US disclosed
US-8564142-B2 Radiation curable ink jet ink composition and ink jet recording method SEIKO EPSON CORPORATION (JP) 2013-10-22 US disclosed
US-20130258018-A1 INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK, AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-20130258015-A1 ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20120133059-A1 RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-7763686-B2 Having a narrow molecular weight distribution in a short amount of time and with good productivity by mixing a first Lewis acid with a proton source to generate initiator cations, and adding a vinyl ether and a second Lewis acid to initiate a high-speed polymerization CANON KABUSHIKI KAISHA (JP) 2010-07-27 US disclosed
US-20060194935-A1 Process for producing polyalkenyl ether CANON KABUSHIKI KAISHA (JP) 2006-08-31 US disclosed