SCHEMBL2295734

SCHEMBL2295734

O=C(O)CC(=O)OC(O)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.42
MAPK1 P28482 1/20 0.42
KMT2A Q03164 1/20 0.41
BCAT2 O15382 1/20 0.41
CRHBP P24387 1/20 0.41
CRHR2 Q13324 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
KDM4E B2RXH2 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
GABBR2 O75899 1/20 0.39
GABBR1 Q9UBS5 1/20 0.39
CYP2C19 P33261 1/20 0.39
CYP2D6 P10635 1/20 0.39
SRC P12931 1/20 0.39
TSHR P16473 2/20 0.39
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28057808 0.92 LMNA (0.45) LMNAMAPK1KMT2ABCAT2CRHBP
SCHEMBL5613929 0.84 GABBR2 (0.44) LMNAKMT2AGABBR2GABBR1CYP2C19
SCHEMBL27821076 0.82 CRHBP (0.57) LMNAMAPK1KMT2ACRHBPCRHR2
SCHEMBL11588080 0.81 GABBR2 (0.43) LMNAMAPK1BCAT2SMN1; SMN2GABBR2
SCHEMBL27751084 0.81 LMNA (0.45) LMNAMAPK1KMT2AKDM4ETSHR
SCHEMBL11588773 0.80 CRHBP (0.44) LMNAMAPK1KMT2ABCAT2CRHBP
SCHEMBL31474590 0.79 KMT2A (0.40) LMNAKMT2ACRHBPCRHR2SMN1; SMN2
SCHEMBL31474589 0.79 CES2 (0.44) LMNAMAPK1KMT2ACRHBPCRHR2
SCHEMBL7309367 0.79 HCAR2 (0.53) LMNAKMT2AKDM4ETSHR
SCHEMBL27471886 0.78 KMT2A (0.39) MAPK1KMT2ACRHBPCRHR2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104122719-A Method of manufacturing liquid crystal display device SAMSUNG DISPLAY CO LTD 2014-10-29 CN claimed
CN-103969863-A Liquid crystal display device SAMSUNG DISPLAY CO LTD 2014-08-06 CN claimed
CN-114616264-B Oligomer or polymer, composition, use of oligomer or polymer and intermediate 弗劳恩霍夫应用研究促进协会 2024-03-01 CN disclosed
CN-114616264-A Oligomer or polymer, composition, use of oligomer or polymer and intermediate 弗劳恩霍夫应用研究促进协会 2022-06-10 CN disclosed
CN-110446732-A The polyurethane discharged with reduced aldehyde DOW GLOBAL TECHNOLOGIES LLC 2019-11-12 CN disclosed
CN-110446731-A Polyurethane foam with low aldehyde emission level DOW GLOBAL TECHNOLOGIES LLC 2019-11-12 CN disclosed
CN-110446733-A The polyurethane foam discharged with reduced aldehyde DOW GLOBAL TECHNOLOGIES LLC 2019-11-12 CN disclosed
CN-104619490-B Multilayer encapsulation film for photovoltaic module 凡登(常州)新型金属材料技术有限公司 2018-10-09 CN disclosed
CN-108495888-A Additive mixture for stabilizing polyols and polyurethanes 巴斯夫欧洲公司 2018-09-04 CN disclosed
CN-103562242-B Molding material and molded article 三菱化学株式会社 2018-07-27 CN disclosed
CN-105778926-A Liquid crystal composition and liquid crystal display including the same 三星显示有限公司 2016-07-20 CN disclosed
EP-0487036-B1 Organic phosphites suitable as stabilizers and polymer compositions comprising them MONTELL NORTH AMERICA INC (US) 1996-02-07 EP disclosed
US-5326801-A Photoresistance, heat resistance, oxidation resistance HIMONT INCORPORATED (US) 1994-07-05 US disclosed
US-5162548-A ORGANIC PHOSPHITES SUITABLE AS STABILIZERS FOR POLYMERS HIMONT INCORPORATED (US) 1992-11-10 US disclosed
EP-0487036-A1 Organic phosphites suitable as stabilizers and polymer compositions comprising them MONTELL NORTH AMERICA INC. (US) 1992-05-27 EP disclosed
US-4369275-A PHOTOSTABILITY FOR POLYMERS CIBA-GEIGY AG (CH) 1983-01-18 US disclosed
EP-0002260-B1 MALONIC ACID DERIVATIVES OF STERICALLY HINDERED PIPERIDINES, PROCESS FOR THEIR PREPARATION AND STABILISED ORGANIC MATTER CIBA-GEIGY AG (CH) 1982-07-14 EP disclosed
US-4293468-A Malonate derivatives as stabilizers for organic materials CIBA-GEIGY AG (CH) 1981-10-06 US disclosed
EP-0002260-A2 Malonic acid derivatives of sterically hindered piperidines, process for their preparation and stabilised organic matter CIBA-GEIGY AG (CH) 1979-06-13 EP disclosed
US-4081475-A Trialkylsubstituted hydroxybenzyl malonates and stabilized compositions CIBA-GEIGY CORPORATION (US) 1978-03-28 US disclosed