SCHEMBL23089971

SCHEMBL23089971

CCOc1c2ccccc2cc2ccc(Cl)cc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.44
TSHR P16473 2/20 0.44
GAA P10253 1/20 0.44
CYP2A6 P11509 1/20 0.41
SLC2A1 P11166 1/20 0.39
L3MBTL1 Q9Y468 3/20 0.38
KCNH2 Q12809 1/20 0.38
ALOX5 P09917 1/20 0.37
THRB P10828 1/20 0.36
EHMT2 Q96KQ7 1/20 0.36
GPR84 Q9NQS5 1/20 0.36
IDO1 P14902 1/20 0.36
NR1I2 O75469 1/20 0.35
KDM4E B2RXH2 2/20 0.35
NPSR1 Q6W5P4 1/20 0.35
NR4A2 P43354 1/20 0.35
HPGD P15428 1/20 0.35
MAPK1 P28482 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29372694 0.88 L3MBTL1 (0.41) TSHRGAACYP2A6SLC2A1L3MBTL1
SCHEMBL23089972 0.88 L3MBTL1 (0.41) TSHRGAACYP2A6SLC2A1L3MBTL1
SCHEMBL29371892 0.86 KCNH2 (0.46) GAACYP2A6SLC2A1L3MBTL1KCNH2
SCHEMBL23089914 0.86 KCNH2 (0.46) GAACYP2A6SLC2A1L3MBTL1KCNH2
SCHEMBL29694174 0.86 GPR84 (0.44) CYP2A6SLC2A1L3MBTL1ALOX5GPR84
SCHEMBL644629 0.86 GPR84 (0.44) CYP2A6SLC2A1L3MBTL1ALOX5GPR84
SCHEMBL23089945 0.85 KCNH2 (0.43) GAACYP2A6SLC2A1L3MBTL1KCNH2
SCHEMBL29371366 0.85 KCNH2 (0.43) GAACYP2A6SLC2A1L3MBTL1KCNH2
SCHEMBL23089966 0.84 KCNA3 (0.42) GAASLC2A1L3MBTL1KCNH2CYP1A2
SCHEMBL23089899 0.84 KCNA3 (0.42) GAASLC2A1L3MBTL1KCNH2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
US-11352450-B2 Photopolymerization sensitizer composition KAWASAKI KASEI CHEMICALS LTD. (JP) 2022-06-07 US disclosed
CN-111868105-B Photopolymerizable sensitizer composition 川崎化成工业株式会社 2022-05-13 CN disclosed
CN-106970503-B Photosensitive composition 东京应化工业株式会社 2022-02-01 CN disclosed
US-20210079127-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-03-18 US disclosed
CN-112394617-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2021-02-23 CN disclosed
CN-111868105-A Photopolymerizable sensitizer composition 川崎化成工业株式会社 2020-10-30 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-110955114-A Photosensitive resin composition, method for producing patterned cured film, and cured film 东京应化工业株式会社 2020-04-03 CN disclosed