Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.44 |
| ▸ | HTR2A | P28223 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.43 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.42 |
| ▸ | BTK | Q06187 | 1/20 | 0.41 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.41 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.40 |
| ▸ | TUBB | P07437 | 1/20 | 0.40 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.40 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.40 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.40 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.40 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.40 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.40 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.40 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.40 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.40 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29694174 | 1.00 | GPR84 (0.44) | GPR84HTR2AL3MBTL1SLC2A1NR1I2 | |
| Boric Acid SCHEMBL28924899 | 0.92 | SLC2A1 (0.43) | GPR84HTR2AL3MBTL1SLC2A1NR1I2 | |
| SCHEMBL23089898 | 0.88 | CYP2A6 (0.42) | GPR84L3MBTL1SLC2A1NR1I2ALOX5 | |
| SCHEMBL28274935 | 0.88 | L3MBTL1 (0.43) | L3MBTL1SLC2A1TUBB4ATUBBTUBA3C | |
| SCHEMBL23089943 | 0.86 | CYP1A2 (0.50) | GPR84SLC2A1NR1I2BTKALOX5 | |
| SCHEMBL23089971 | 0.86 | POLB (0.44) | GPR84L3MBTL1SLC2A1NR1I2ALOX5 | |
| SCHEMBL23089905 | 0.86 | CYP2A6 (0.41) | GPR84HTR2ASLC2A1NR1I2BTK | |
| SCHEMBL2250811 | 0.85 | ALOX5 (0.36) | GPR84HTR2AL3MBTL1SLC2A1NR1I2 | |
| SCHEMBL2254017 | 0.85 | SLC2A1 (0.36) | GPR84HTR2AL3MBTL1SLC2A1NR1I2 | |
| SCHEMBL16680272 | 0.85 | KIF11 (0.41) | GPR84HTR2ASLC2A1NR1I2BTK |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 445 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110407984-A | A kind of viscosity reduction fluorescent type poly carboxylic acid series water reducer and preparation method thereof | JIANGSU ARIT NEW MAT CO LTD | 2019-11-05 | — | — | CN | claimed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| CN-122070516-A | Negative photosensitive composition, photosensitive resist film, method for producing hollow structure, and method for forming pattern | 东京应化工业株式会社 | 2026-05-19 | — | — | CN | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| EP-4722199-A1 | AZOLE COMPOUND, METHOD FOR SYNTHESIZING SAID AZOLE COMPOUND, AND USE THEREOF | SHIKOKU CHEMICALS CORPORATION (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-12422747-B2 | Negative photosensitive resin composition, pattern formation method, and laminated film | SAN-APRO LTD. (JP) | 2025-09-23 | — | — | US | disclosed |
| US-20250170800-A1 | PRODUCTION METHOD FOR HOLLOW STRUCTURE, LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| WO-2025094787-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIST FILM, METHOD FOR PRODUCING HOLLOW STRUCTURE, AND PATTERN FORMING METHOD | 東京応化工業株式会社 | 2025-05-08 | — | — | WO | disclosed |
| EP-0284868-B1 | Photoresist compositions | MICROSI INC (US) | 1995-05-03 | — | — | EP | disclosed |
| US-5362607-A | Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt | MICROSI, INC. (US) | 1994-11-08 | — | — | US | disclosed |
| US-5340697-A | Comprising light sensitive triazine, acid-crosslinkable material, and alkali soluble esin | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| US-5310619-A | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable | MICROSI, INC. (US) | 1994-05-10 | — | — | US | disclosed |
| EP-0439816-B1 | PROCESS FOR OBTENTION OF CYCLOHEXENE FROM MIXTURES CONTAINING CYCLOHEXENE, BENZENE AND/OR CYCLOHEXANE | BASF Aktiengesellschaft (DE) | 1993-09-01 | — | — | EP | disclosed |
| EP-0541112-A1 | Positive type light-senstitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-12 | — | — | EP | disclosed |
| EP-0439816-A1 | Process for obtention of cyclohexene from mixtures containing cyclohexene, benzene and/or cyclohexane | BASF Aktiengesellschaft (DE) | 1991-08-07 | — | — | EP | disclosed |
| EP-0284868-A2 | Photoresist compositions | MicroSi, Inc. (a Delaware corporation) (US) | 1988-10-05 | — | — | EP | disclosed |
| EP-0249139-A2 | Resist compositions and use | MicroSi, Inc. (a Delaware corporation) (US) | 1987-12-16 | — | — | EP | disclosed |
| US-4603101-A | Photoresist compositions containing t-substituted organomethyl vinylaryl ether materials | GENERAL ELECTRIC COMPANY (US) | 1986-07-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12422747-B2 | Negative photosensitive resin composition, pattern formation method, and laminated film | H1-10, PUF60, IGLV6-57 | GPR84 2018/4885HTR2A 2869/4885L3MBTL1 3340/4885 |
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | GPR84 3405/4885HTR2A 1677/4885L3MBTL1 358/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | GPR84 3839/4885HTR2A 4389/4885L3MBTL1 629/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.