SCHEMBL231605

SCHEMBL231605

C=C[Si](C=C)(NC(C)C)NC(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25171696 0.75 TSHR (0.31) TSHR
SCHEMBL233275 0.75 TSHR (0.31) TSHR
SCHEMBL4579168 0.73
SCHEMBL3076717 0.73
SCHEMBL25175177 0.73 ALDH1A1 (0.31) TSHR
SCHEMBL31612911 0.67
SCHEMBL11453692 0.63
SCHEMBL3109925 0.63
SCHEMBL9893554 0.63
SCHEMBL235984 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12584212-B2 Compositions and methods using same for germanium seed layer VERSUM MATERIALS US, LLC (US) 2026-03-24 US claimed
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US claimed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP claimed
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC 2023-09-14 US claimed
EP-4176100-A1 COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER Versum Materials US, LLC (US) 2023-05-10 EP claimed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US claimed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO claimed
WO-2022020705-A1 COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER VERSUM MATERIALS US, LLC (US) 2022-01-27 WO claimed
EP-2463404-B1 METHOD FOR FORMING SIO2 FILM VERSUM MAT US LLC (US) 2019-10-23 EP claimed
EP-2251899-B1 Dielectric barrier deposition using nitrogen containing precursor VERSUM MAT US LLC (US) 2018-03-28 EP claimed
US-8889235-B2 Dielectric barrier deposition using nitrogen containing precursor AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-11-18 US claimed
US-20140065844-A1 Amino Vinylsilane Precursors for Stressed SiN Films VERSUM MATERIALS US, LLC 2014-03-06 US claimed
US-8580993-B2 Amino vinylsilane precursors for stressed SiN films AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-11-12 US claimed
US-8460753-B2 Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-06-11 US claimed
EP-2192207-B1 Method using amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films AIR PROD & CHEM (US) 2012-06-20 EP claimed
EP-2465861-A1 Amino vinylsilane precursors for compressively stressed SiN films Air Products and Chemicals, Inc. (US) 2012-06-20 EP claimed
US-20100291321-A1 Dielectric Barrier Deposition Using Nitrogen Containing Precursor AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-11-18 US claimed
EP-2251899-A1 Dielectric barrier deposition using nitrogen containing precursor Air Products and Chemicals, Inc. (US) 2010-11-17 EP claimed
EP-2192207-A1 Amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-06-02 EP claimed
US-20100120262-A1 Amino Vinylsilane Precursors for Stressed SiN Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-05-13 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230287562-A1 COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER GMNN, AGL, GYS2 TSHR 4742/4885
US-12584212-B2 Compositions and methods using same for germanium seed layer HAO2, AGL, SCO2 TSHR 2477/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.