SCHEMBL23208306

SCHEMBL23208306

O=C(O)COc1ccc(-c2cccc(-c3ccc(OCC(=O)O)cc3)c2S(=O)(=O)O)cc1

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.53
▸ ALOX15 P16050 1/20 0.51
▸ ACACA Q13085 1/20 0.48
▸ FFAR1 O14842 2/20 0.47
▸ PTPN1 P18031 1/20 0.47
▸ MEN1 O00255 2/20 0.46
▸ KMT2A Q03164 2/20 0.46
▸ PTPN7 P35236 2/20 0.46
▸ MAPT P10636 1/20 0.46
▸ PTPN12 Q05209 1/20 0.46
▸ NR1H4 Q96RI1 1/20 0.46
▸ PPARD Q03181 2/20 0.44
▸ PPARG P37231 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ MAP4K4 O95819 1/20 0.43
▸ PPARA Q07869 1/20 0.43
▸ TBXA2R P21731 1/20 0.43
▸ TBXAS1 P24557 1/20 0.43
▸ LMNA P02545 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21794098 0.81 PTPN1 (0.52) PTPN1MEN1KMT2AMAPTLMNA
SCHEMBL6808855 0.77 ALOX15 (0.53) ALDH1A1ALOX15ACACAFFAR1PTPN1
SCHEMBL2780802 0.76 ALOX15 (0.71) ALDH1A1ALOX15FFAR1MEN1KMT2A
SCHEMBL11753256 0.75 ALDH1A1 (0.76) ALDH1A1ALOX15FFAR1MEN1KMT2A
SCHEMBL12646397 0.75 ALOX15 (0.59) ALDH1A1ALOX15ACACAFFAR1MEN1
SCHEMBL422442 0.75 ALOX15 (0.76) ALDH1A1ALOX15ACACAFFAR1MEN1
SCHEMBL21794264 0.74 TSHR (0.46) ALDH1A1KMT2ASMN1; SMN2
SCHEMBL339492 0.74 ALOX15 (0.81) ALDH1A1ALOX15FFAR1MEN1KMT2A
SCHEMBL23208302 0.74 FOLH1 (0.46) —
SCHEMBL1040365 0.74 ALDH1A1 (0.73) ALDH1A1ALOX15FFAR1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220206386-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2022-06-30 — — US disclosed
WO-2021065450-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2021-04-08 — — WO disclosed
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