Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERN1 | O75460 | 2/20 | 0.36 |
| ▸ | GSTP1 | P09211 | 2/20 | 0.35 |
| ▸ | EGFR | P00533 | 2/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | FYN | P06241 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.31 |
| ▸ | CA9 | Q16790 | 2/20 | 0.31 |
| ▸ | IKBKB | O14920 | 1/20 | 0.31 |
| ▸ | CHUK | O15111 | 1/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21794137 | 0.80 | FYN (0.49) | ERN1GSTP1EGFRFYN | |
| SCHEMBL21794163 | 0.77 | CA2 (0.41) | ERN1PTGS2FYNCA2CA9 | |
| SCHEMBL24581546 | 0.76 | EGFR (0.47) | GSTP1EGFRFYNCA2CA9 | |
| SCHEMBL21794146 | 0.74 | SMN1; SMN2 (0.50) | ERN1PTGS2CA2CA9CA1 | |
| SCHEMBL21794266 | 0.73 | ESR1 (0.50) | FYN | |
| SCHEMBL23432948 | 0.71 | CA1 (0.54) | ERN1EGFRPTGS2CA2CA9 | |
| SCHEMBL24995338 | 0.69 | ERN1 (0.36) | ERN1 | |
| SCHEMBL21794139 | 0.68 | MMP3 (0.52) | EGFR | |
| SCHEMBL21794265 | 0.68 | PTPN1 (0.47) | PTGS2CA2CA9IKBKBCHUK | |
| SCHEMBL14815509 | 0.68 | MCHR1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220206386-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |