SCHEMBL23264379

SCHEMBL23264379

CC(C)(C)c1ccc2c(O)cccc2c1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 2/20 0.56
▸ GABRA1 P14867 1/20 0.48
▸ GABRB2 P47870 1/20 0.48
▸ ALDH1A1 P00352 5/20 0.48
▸ TDP1 Q9NUW8 3/20 0.48
▸ TSHR P16473 2/20 0.48
▸ KCNJ11 Q14654 1/20 0.42
▸ CDK2 P24941 2/20 0.41
▸ NPSR1 Q6W5P4 1/20 0.41
▸ IDO1 P14902 2/20 0.41
▸ ALOX12 P18054 1/20 0.41
▸ ALOX15 P16050 4/20 0.40
▸ HSD17B10 Q99714 4/20 0.40
▸ CYP1A2 P05177 3/20 0.40
▸ HPGD P15428 3/20 0.40
▸ MAPT P10636 2/20 0.40
▸ RECQL P46063 2/20 0.40
▸ APP P05067 1/20 0.40
▸ THRB P10828 1/20 0.40
▸ CASP1 P29466 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11477439 0.85 CA2 (0.59) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL23861564 0.83 KCNJ11 (0.42) CA2ALDH1A1TDP1TSHRKCNJ11
SCHEMBL17722821 0.82 KCNJ11 (0.38) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL7764200 0.81 ALDH1A1 (0.60) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL7520146 0.78 LMNA (0.55) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL6399211 0.77 IDO1 (0.59) CA2ALDH1A1TDP1TSHRIDO1
SCHEMBL30504750 0.76 CA2 (0.76) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL36109 0.76 CA2 (0.76) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL19196132 0.76 CA2 (0.56) CA2GABRA1GABRB2ALDH1A1TDP1
SCHEMBL24187560 0.76 ALOX15 (0.61) CA2GABRA1GABRB2ALDH1A1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210116814-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION USING CARBON-OXYGEN DOUBLE BOND NISSAN CHEMICAL CORPORATION (JP) 2021-04-22 — — US disclosed
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