SCHEMBL23383015

SCHEMBL23383015

COCOC(=O)c1ccc(C(=O)OCC(F)(F)C(=O)O)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPK1 P28482 2/20 0.45
▸ HIF1A Q16665 1/20 0.45
▸ SCN5A Q14524 2/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ HTR1A P08908 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ SCN1A P35498 1/20 0.38
▸ SLC6A3 Q01959 1/20 0.38
▸ SCN2A Q99250 1/20 0.38
▸ SCN3A Q9NY46 1/20 0.38
▸ ESR1 P03372 2/20 0.38
▸ CA12 O43570 1/20 0.38
▸ CA1 P00915 1/20 0.38
▸ CA2 P00918 1/20 0.38
▸ CA7 P43166 1/20 0.38
▸ CA9 Q16790 1/20 0.38
▸ ESR2 Q92731 1/20 0.38
▸ CA14 Q9ULX7 1/20 0.38
▸ CYP3A4 P08684 2/20 0.37
▸ ABCB11 O95342 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382491 0.88 MAPT (0.43) MAPK1HIF1ATDP1SCN1ASCN2A
SCHEMBL23383019 0.85 MAPK1 (0.42) MAPK1HIF1ASCN5ATDP1HTR1A
SCHEMBL23559376 0.84 RAB9A (0.51) MAPK1HIF1ATDP1ESR1CA12
SCHEMBL24361312 0.82 ESR1 (0.53) MAPK1HIF1ATDP1CYP2D6ESR1
SCHEMBL24361126 0.82 MAPK1 (0.67) MAPK1HIF1ASCN5ATDP1HTR1A
SCHEMBL23382489 0.81 MAPK1 (0.45) MAPK1HIF1ASCN5ATDP1HTR1A
SCHEMBL14898425 0.81 ESR1 (0.52) MAPK1TDP1CYP2D6ESR1CA12
SCHEMBL23559299 0.81 MAPK1 (0.47) MAPK1HIF1ASCN5ATDP1HTR1A
SCHEMBL24361313 0.81 CES2 (0.48) MAPK1HIF1ACYP3A4LMNACYP1A2
SCHEMBL23382690 0.79 TP53 (0.47) MAPK1HIF1ASCN5ATDP1HTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 MAPK1 229/4885HIF1A 4225/4885SCN5A 781/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 MAPK1 229/4885HIF1A 4225/4885SCN5A 781/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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