SCHEMBL23382491

SCHEMBL23382491

COCOc1ccc(C(=O)OCC(F)(F)C(=O)O)cc1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.43
▸ RAB9A P51151 3/20 0.42
▸ MAPK1 P28482 1/20 0.41
▸ HIF1A Q16665 1/20 0.41
▸ SMN1; SMN2 Q16637 3/20 0.40
▸ NPC1 O15118 2/20 0.40
▸ ALDH1A1 P00352 2/20 0.38
▸ LMNA P02545 1/20 0.38
▸ SCN1A P35498 1/20 0.38
▸ SCN2A Q99250 1/20 0.38
▸ SCN3A Q9NY46 1/20 0.38
▸ TP53 P04637 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ FYN P06241 1/20 0.37
▸ ESR2 Q92731 1/20 0.37
▸ TDP1 Q9NUW8 2/20 0.36
▸ GAA P10253 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23383015 0.88 MAPK1 (0.45) MAPTRAB9AMAPK1HIF1ANPC1
SCHEMBL23382483 0.88 ALDH1A1 (0.43) MAPTRAB9AMAPK1HIF1ASMN1; SMN2
SCHEMBL31384818 0.80 MAPT (0.55) MAPTRAB9ASMN1; SMN2NPC1ALDH1A1
SCHEMBL23382690 0.80 TP53 (0.47) MAPTMAPK1HIF1ASMN1; SMN2ALDH1A1
SCHEMBL23382492 0.80 KMT2A (0.40) MAPTRAB9AMAPK1HIF1ASMN1; SMN2
SCHEMBL23559376 0.79 RAB9A (0.51) MAPTRAB9AMAPK1HIF1ASMN1; SMN2
SCHEMBL23382691 0.78 TP53 (0.45) MAPTMAPK1HIF1ASMN1; SMN2ALDH1A1
SCHEMBL24361312 0.77 ESR1 (0.53) MAPTRAB9AMAPK1HIF1ASMN1; SMN2
SCHEMBL6279787 0.77 CA12 (0.58) MAPTRAB9AALDH1A1LMNASCN1A
SCHEMBL24361126 0.77 MAPK1 (0.67) RAB9AMAPK1HIF1ANPC1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA MAPT 2279/4885RAB9A 1846/4885MAPK1 279/4885
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 MAPT 1694/4885RAB9A 1403/4885MAPK1 229/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 MAPT 1694/4885RAB9A 1403/4885MAPK1 229/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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