Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.51 |
| ▸ | HTT | P42858 | 1/20 | 0.51 |
| ▸ | NPC1 | O15118 | 6/20 | 0.50 |
| ▸ | RAB9A | P51151 | 6/20 | 0.50 |
| ▸ | GAA | P10253 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | DHODH | Q02127 | 1/20 | 0.44 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.43 |
| ▸ | JAK2 | O60674 | 2/20 | 0.43 |
| ▸ | JAK1 | P23458 | 2/20 | 0.43 |
| ▸ | TYK2 | P29597 | 2/20 | 0.43 |
| ▸ | JAK3 | P52333 | 2/20 | 0.43 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10364153 | 0.83 | NPC1 (0.44) | KDM4EHTTNPC1RAB9AGAA | |
| SCHEMBL6387107 | 0.75 | HPGD (0.66) | KDM4EHTTGAASMN1; SMN2ALDH1A1 | |
| SCHEMBL27154650 | 0.74 | KDM4E (0.61) | KDM4EHTTNPC1RAB9AGAA | |
| SCHEMBL23559424 | 0.74 | HPGD (0.55) | KDM4EHTTSMN1; SMN2ALDH1A1HPGD | |
| SCHEMBL2252555 | 0.74 | NPC1 (0.92) | KDM4EHTTNPC1RAB9AGAA | |
| SCHEMBL19542387 | 0.73 | NPC1 (0.45) | KDM4ENPC1RAB9AGAASMN1; SMN2 | |
| SCHEMBL22649095 | 0.71 | NPC1 (0.67) | KDM4EHTTNPC1RAB9AGAA | |
| SCHEMBL24295036 | 0.71 | NPC1 (0.84) | KDM4ENPC1RAB9AGAASMN1; SMN2 | |
| SCHEMBL105095 | 0.71 | NPC1 (1.00) | KDM4EHTTNPC1RAB9AGAA | |
| Benzene SCHEMBL28005151 | 0.71 | NPC1 (1.00) | KDM4EHTTNPC1RAB9AGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20210149301-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | KDM4E 4034/4885HTT 3620/4885NPC1 2400/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | KDM4E 4195/4885HTT 3740/4885NPC1 2087/4885 |
| US-20210149301-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | IDUA, SLC6A5, SLC6A9 | KDM4E 4195/4885HTT 3740/4885NPC1 2087/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.