SCHEMBL23489458

SCHEMBL23489458

C=CCOCC(=C)C(=O)Oc1ccc(C(F)(F)F)cc1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.42
ALDH1A1 P00352 1/20 0.40
LSS P48449 1/20 0.37
CYP11B1 P15538 3/20 0.36
CYP11B2 P19099 3/20 0.36
PPARD Q03181 2/20 0.36
TGM2 P21980 1/20 0.36
MAOB P27338 3/20 0.36
AOC3 Q16853 1/20 0.36
PRSS1 P07477 1/20 0.36
ACR P10323 1/20 0.36
TEAD1 P28347 1/20 0.36
LMNA P02545 1/20 0.36
MAPK1 P28482 1/20 0.36
RAB9A P51151 1/20 0.36
GRM4 Q14833 1/20 0.34
PPARG P37231 1/20 0.34
PPARA Q07869 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL352554 0.86 SMN1; SMN2 (0.43) ALDH1A1MAOBAOC3PRSS1ACR
SCHEMBL23489582 0.83 ADRB2 (0.37) ALDH1A1CYP11B1CYP11B2PRSS1ACR
SCHEMBL352678 0.82 LMNA (0.42) ALDH1A1LMNA
SCHEMBL351044 0.81 CYP3A4 (0.40) ALDH1A1RAB9A
SCHEMBL23489684 0.78 ALDH1A1 (0.40) ALDH1A1LMNAMAPK1RAB9A
SCHEMBL23474737 0.77 ELANE (0.40) ALDH1A1RAB9A
SCHEMBL23489698 0.76 LMNA (0.35) LMNAMAPK1RAB9A
SCHEMBL9575659 0.73 KIF11 (0.54) KIF11ALDH1A1CYP11B1CYP11B2MAOB
SCHEMBL23474728 0.72 ALDH1A1 (0.34) ALDH1A1MAOBLMNA
SCHEMBL14536591 0.71 ELANE (0.54) KIF11ALDH1A1CYP11B1CYP11B2MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021111913-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND JSR株式会社 2021-06-10 WO disclosed