SCHEMBL23558707

SCHEMBL23558707

C=Cc1ccc(OC(=O)Oc2ccc3c(c2)OC(C)(C)O3)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 7/20 0.36
MEN1 O00255 5/20 0.36
MAPT P10636 4/20 0.36
LMNA P02545 3/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
TP53 P04637 2/20 0.36
KDM4E B2RXH2 2/20 0.36
TTR P02766 1/20 0.36
CYP3A4 P08684 1/20 0.36
NPC1 O15118 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2C9 P11712 1/20 0.34
HPGD P15428 1/20 0.34
CYP2C19 P33261 1/20 0.34
RAB9A P51151 1/20 0.34
TRPV1 Q8NER1 1/20 0.34
TSHR P16473 1/20 0.34
NFKB1 P19838 4/20 0.34
NFKB2 Q00653 4/20 0.34
RELA Q04206 4/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23558750 0.87 HIF1A (0.44) KMT2AMEN1MAPTLMNAHPGD
SCHEMBL23559173 0.84 KMT2A (0.41) KMT2AMEN1MAPTLMNASMN1; SMN2
SCHEMBL23558956 0.84 GAA (0.42) KMT2AMEN1MAPTLMNASMN1; SMN2
SCHEMBL23558726 0.84 L3MBTL1 (0.43) KMT2AMAPTLMNASMN1; SMN2KDM4E
SCHEMBL23558770 0.81 TSHR (0.39) KMT2ASMN1; SMN2NPC1CYP1A2CYP2C9
SCHEMBL23558705 0.81 ELANE (0.43) KMT2AMEN1MAPTLMNASMN1; SMN2
SCHEMBL2267166 0.78 LMNA (0.48) KMT2AMEN1MAPTLMNASMN1; SMN2
SCHEMBL2791741 0.77 ALDH1A1 (0.50) KMT2AMEN1MAPTLMNASMN1; SMN2
SCHEMBL16379410 0.76 TSHR (0.50) KMT2AMEN1MAPTSMN1; SMN2TP53
SCHEMBL8282264 0.74 CA2 (0.40) KMT2AMEN1MAPTLMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210191266-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-06-24 US disclosed