SCHEMBL23559271

SCHEMBL23559271

O=C(O)C(F)(F)C(O)c1ccc(I)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TPMT P51580 1/20 0.39
GSK3B P49841 1/20 0.38
CES2 O00748 1/20 0.37
CES1 P23141 1/20 0.37
GABBR2 O75899 2/20 0.36
GABBR1 Q9UBS5 2/20 0.36
TRPV1 Q8NER1 3/20 0.34
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
ACACB O00763 1/20 0.33
PDPK1 O15530 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33
HDAC8 Q9BY41 1/20 0.33
HDAC6 Q9UBN7 1/20 0.33
CNR1 P21554 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
HIF1A Q16665 1/20 0.32
CAPN1 P07384 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24361184 0.82 HDAC3 (0.41) CES2CES1GABBR2GABBR1HDAC1
SCHEMBL24361176 0.82 ESR1 (0.48) CES2CES1GABBR2GABBR1CA1
SCHEMBL15114536 0.82 LMNA (0.47) CES2CES1GABBR2GABBR1CYP2D6
SCHEMBL24361179 0.78 FOLH1 (0.36) GABBR2GABBR1CYP2D6CYP2C9HIF1A
SCHEMBL12273992 0.77 ESR1 (0.39) TPMTGSK3BCES2CES1TRPV1
SCHEMBL5973 0.77 ESR1 (0.39) TPMTGSK3BCES2CES1TRPV1
SCHEMBL8307725 0.77 KDM4E (0.40) CES2CES1GABBR2GABBR1HDAC1
SCHEMBL24360844 0.75 GABBR2 (0.44) GABBR2GABBR1ACACBCYP2D6PTPN1
SCHEMBL23559275 0.74 TTR (0.35) GABBR2GABBR1CYP2C9HIF1A
SCHEMBL19510381 0.74 L3MBTL1 (0.41) ACACB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-04-28 US disclosed
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220127225-A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS CACNA1F, SLC6A5, IDUA TPMT 3771/4885GSK3B 551/4885CES2 3904/4885
US-20210188770-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SLC6A5, LIFR, SLC6A9 TPMT 2977/4885GSK3B 435/4885CES2 3260/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.