SCHEMBL23604368

SCHEMBL23604368

CCC(O)COC(=O)c1ccccc1C(c1ccc(OCCC(C)C)cc1)c1ccc(OCCC(C)C)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TP53 P04637 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.44
▸ ALDH1A1 P00352 2/20 0.42
▸ TSHR P16473 1/20 0.42
▸ MAPK1 P28482 1/20 0.41
▸ ADRB2 P07550 7/20 0.41
▸ ADRB1 P08588 7/20 0.41
▸ ADRB3 P13945 7/20 0.41
▸ HTT P42858 2/20 0.41
▸ GAA P10253 1/20 0.41
▸ EPHX2 P34913 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ LMNA P02545 1/20 0.39
▸ CA2 P00918 1/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ MEN1 O00255 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ TDP1 Q9NUW8 1/20 0.38
▸ PRSS1 P07477 1/20 0.37
▸ PRSS2 P07478 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23604409 0.90 ADRB2 (0.48) SMN1; SMN2ALDH1A1TSHRADRB2ADRB1
SCHEMBL23604408 0.84 ADRB2 (0.43) TP53SMN1; SMN2ALDH1A1TSHRADRB2
SCHEMBL23604411 0.83 NPC1 (0.42) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL23604406 0.83 ADRB2 (0.49) SMN1; SMN2ALDH1A1TSHRADRB2ADRB1
SCHEMBL23604366 0.73 ADRB2 (0.38) ALDH1A1TSHRMAPK1ADRB2ADRB1
SCHEMBL15237076 0.73 TSHR (0.65) TP53ALDH1A1TSHRMAPK1ADRB2
SCHEMBL9121903 0.71 ALDH1A1 (0.41) TP53SMN1; SMN2ALDH1A1TSHRMAPK1
SCHEMBL23604743 0.70 ADRB2 (0.41) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL23604744 0.70 ADRB2 (0.51) ALDH1A1TSHRADRB2ADRB1ADRB3
SCHEMBL9124579 0.69 ALDH1A1 (0.52) ALDH1A1TSHRMAPK1GAAL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210198472-A1 MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-01 — — US disclosed
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