SCHEMBL23604409

SCHEMBL23604409

CCCOc1ccc(C(c2ccc(OCCC)cc2)c2ccccc2C(=O)OCC(O)CC)cc1

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ ADRB2 P07550 7/20 0.48
▸ ADRB1 P08588 7/20 0.48
▸ ADRB3 P13945 7/20 0.48
▸ ALDH1A1 P00352 5/20 0.43
▸ KMT2A Q03164 1/20 0.41
▸ TSHR P16473 2/20 0.41
▸ TDP1 Q9NUW8 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ CA2 P00918 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ SMN1; SMN2 Q16637 3/20 0.40
▸ GPR88 Q9GZN0 1/20 0.39
▸ PRSS1 P07477 1/20 0.39
▸ PRSS2 P07478 1/20 0.39
▸ PRSS3 P35030 1/20 0.39
▸ LMNA P02545 1/20 0.38
▸ FAAH O00519 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23604368 0.90 TP53 (0.44) ADRB2ADRB1ADRB3ALDH1A1KMT2A
SCHEMBL23604408 0.87 ADRB2 (0.43) ADRB2ADRB1ADRB3ALDH1A1KMT2A
SCHEMBL23604411 0.86 NPC1 (0.42) ADRB2ADRB1ADRB3ALDH1A1TSHR
SCHEMBL23604406 0.86 ADRB2 (0.49) ADRB2ADRB1ADRB3ALDH1A1KMT2A
SCHEMBL23604744 0.79 ADRB2 (0.51) ADRB2ADRB1ADRB3ALDH1A1TSHR
SCHEMBL15237076 0.75 TSHR (0.65) ADRB2ADRB1ADRB3ALDH1A1TSHR
SCHEMBL9121903 0.73 ALDH1A1 (0.41) ALDH1A1KMT2ATSHRTDP1L3MBTL1
SCHEMBL23604743 0.73 ADRB2 (0.41) ADRB2ADRB1ADRB3ALDH1A1TSHR
SCHEMBL23604364 0.72 ADRB2 (0.44) ADRB2ADRB1ADRB3ALDH1A1KMT2A
SCHEMBL9124579 0.71 ALDH1A1 (0.52) ALDH1A1KMT2ATSHRTDP1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210198472-A1 MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-01 — — US disclosed
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