Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 4/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.33 |
| ▸ | CRHBP | P24387 | 1/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.33 |
| ▸ | CES2 | O00748 | 1/20 | 0.31 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | METAP2 | P50579 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4825438 | 0.96 | METAP2 (0.32) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| SCHEMBL27790465 | 0.82 | — | — | |
| Propene SCHEMBL27764142 | 0.79 | MEN1 (0.39) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| SCHEMBL203915 | 0.78 | CES2 (0.43) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| Ethylene SCHEMBL4584731 | 0.76 | CES2 (0.39) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| SCHEMBL12939148 | 0.76 | ALDH1A1 (0.32) | SMN1; SMN2PKMGAA | |
| Ammonia Solution, Strong SCHEMBL20291864 | 0.75 | CES2 (0.42) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| SCHEMBL336420 | 0.75 | CES2 (0.42) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| SCHEMBL2150002 | 0.75 | CES2 (0.42) | SMN1; SMN2PKMMEN1KMT2ACRHBP | |
| Formaldehyde SCHEMBL28740243 | 0.75 | MEN1 (0.36) | SMN1; SMN2PKMMEN1KMT2ACRHBP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023054126-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN-FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-04-06 | — | — | WO | disclosed |
| WO-2021131655-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2021-07-01 | — | — | WO | disclosed |