SCHEMBL2363128

SCHEMBL2363128

CC(=CC=Cc1ccccc1)C(=O)OC(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.46
ALDH1A1 P00352 4/20 0.45
KDM4E B2RXH2 2/20 0.45
GAA P10253 1/20 0.44
GLA P06280 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
POLB P06746 1/20 0.43
HPGD P15428 2/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.41
GRIK1 P39086 1/20 0.41
MCL1 Q07820 1/20 0.41
EGFR P00533 1/20 0.41
AKR1C3 P42330 1/20 0.40
MAOB P27338 1/20 0.39
HDAC3 O15379 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1173073 0.91 LMNA (0.40) LMNAALDH1A1KDM4EGAAGLA
Acrylonitrile SCHEMBL22207118 0.89 MCL1 (0.43) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL6672472 0.84 KDM4E (0.44) LMNAALDH1A1KDM4EGAATDP1
SCHEMBL435341 0.83 GAA (0.51) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL4355988 0.83 GAA (0.51) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL35777 0.82 LMNA (0.60) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL8991908 0.82 LMNA (0.60) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL4861367 0.80 LMNA (0.40) LMNAALDH1A1KDM4EGAAGLA
SCHEMBL28915528 0.80 AKR1C3 (0.58) ALDH1A1GAAGLATDP1POLB
SCHEMBL20853874 0.80 AKR1C3 (0.58) ALDH1A1GAAGLATDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9029073-B2 Undercoat agent, and pattern formation method for layer containing block copolymer TOKYO OHKA KOGYO CO., LTD. (JP) 2015-05-12 US claimed
US-20130252179-A1 UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER COMPRISING BLOCK COPOLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2013-09-26 US claimed
US-20230287165-A1 VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER NISSAN CHEMICAL CORPORATION (JP) 2023-09-14 US disclosed
US-9676934-B2 Block copolymer-containing composition and method of reducing pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2017-06-13 US disclosed
US-9666434-B2 Method for forming fine patterns of semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-05-30 US disclosed
US-20160307755-A1 METHOD FOR FORMING FINE PATTERNS OF SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-10-20 US disclosed
US-9029073-B2 Undercoat agent, and pattern formation method for layer containing block copolymer TOKYO OHKA KOGYO CO., LTD. (JP) 2015-05-12 US disclosed
CN-103492190-A Recording media HEWLETT PACKARD DEVELOPMENT CO 2014-01-01 CN disclosed
US-20130252179-A1 UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER COMPRISING BLOCK COPOLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2013-09-26 US disclosed
US-20130240481-A1 BLOCK COPOLYMER-CONTAINING COMPOSITION AND METHOD OF REDUCING PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2013-09-19 US disclosed
US-20110207168-A1 Fiber-Based Biosensors for Use in Detecting the Presence of a Biologically Active Substance NATIONAL SCIENCE FOUNDATION 2011-08-25 US disclosed
WO-2010024889-A1 FIBER-BASED BIOSENSORS FOR USE IN DETECTING THE PRESENCE OF A BIOLOGICALLY ACTIVE SUBSTANCE CLEMSON UNIVERSITY RESEARCH FOUNDATION (US) 2010-03-04 WO disclosed
WO-2010005687-A1 COMPOSITIONS COMPRISING NITRIC OXIDE OR NITRIC OXIDE DONORS FOR THE TREATMENT OF NEURODEGENERATIVE DISEASES OR TRAUMA UNIVERSITY OF ALABAMA HUNTSVILLE (US) 2010-01-14 WO disclosed
WO-2009152479-A1 COMPOSITIONS COMPRISING NITRIC OXIDE OR NITRIC OXIDE DONORS FOR THE TREATMENT OF NEURODEGENERATIVE DISEASES OF TRAUMA UNIVERSITY OF ALABAMA HUNTSVILLE (US) 2009-12-17 WO disclosed
EP-1033624-A1 RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE Clariant International Ltd. (CH) 2000-09-06 EP disclosed
US-5521043-A ELECTROGRAPHY XEROX CORPORATION (US) 1996-05-28 US disclosed