Benzoin

Benzoin

SCHEMBL2363246

C=CC(O)OC(O)C=C.O=C(c1ccccc1)C(O)c1ccccc1

nearest known ligand 0.68

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Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.68
CES2 O00748 4/20 0.68
CES1 P23141 3/20 0.68
ALDH1A1 P00352 3/20 0.50
KDM4E B2RXH2 1/20 0.50
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
MAPK1 P28482 1/20 0.44
CYP3A4 P08684 1/20 0.41
HPGD P15428 1/20 0.41
AKT1 P31749 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
CYP2C19 P33261 1/20 0.37
ALKBH5 Q6P6C2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2363249 0.85 ALDH1A1 (0.54) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL8920029 0.83 LMNA (0.72) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL11601796 0.83 LMNA (0.72) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL37126 0.83 LMNA (0.78) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL29167409 0.82 LMNA (0.91) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL10646810 0.82 LMNA (0.91) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL27562303 0.82 LMNA (0.91) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL145 0.82 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL5833429 0.82 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL2025536 0.82 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7989563-B2 Resin compositions, films using the same and process for producing the films LINTEC CORPORATION (JP) 2011-08-02 US disclosed
US-20090209718-A1 RESIN COMPOSITIONS, FILMS USING THE SAME AND PROCESS FOR PRODUCING THE FILMS LINTEC CORPORATION (JP) 2009-08-20 US disclosed
US-7230061-B2 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth)acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2007-06-12 US disclosed
EP-1454928-B1 PROCESS FOR PRODUCTION OF WATER-SOLUBLE (METH)ACRYLIC POLYMERS, WATER-SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF NIPPON CATALYTIC CHEM IND (JP) 2007-02-28 EP disclosed
EP-1454928-A1 PROCESS FOR PRODUCTION OF WATER−SOLUBLE (METH)ACRYLIC POLYMERS, WATER−SOLUBLE (METH)ACRYLIC POLYMERS, AND USE THEREOF Nippon Shokubai Co., Ltd. (JP) 2004-09-08 EP disclosed
US-20040110861-A1 Process for production of water-soluble (meth)acrylic polymers, water-soluble (meth) acrylic polymers, and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2004-06-10 US disclosed