Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20991778 | 0.94 | HTT (0.36) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL237936 | 0.86 | TSHR (0.38) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL15437935 | 0.85 | MAPT (0.38) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL21905166 | 0.84 | CA1 (0.35) | — | |
| SCHEMBL11857194 | 0.81 | TSHR (0.34) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL14081584 | 0.81 | TSHR (0.41) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL236655 | 0.80 | TSHR (0.37) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL12205533 | 0.80 | TSHR (0.40) | MAPTSMN1; SMN2TSHRTDP1HTT | |
| SCHEMBL14123333 | 0.80 | TRPA1 (0.31) | — | |
| SCHEMBL21905191 | 0.80 | CYP1A2 (0.36) | HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 204 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | claimed |
| EP-3877459-B1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-01-22 | — | — | EP | claimed |
| US-11267955-B2 | Polymer network forming silane compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-03-08 | — | — | US | claimed |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2020-05-07 | — | — | US | claimed |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) | 2026-01-15 | — | — | US | disclosed |
| EP-4554800-A1 | RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES | Sumitomo Chemical Advanced Technologies LLC (US) | 2025-05-21 | — | — | EP | disclosed |
| EP-3877459-B1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-01-22 | — | — | EP | disclosed |
| US-11905428-B2 | Resin compositions and methods of production | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-02-20 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-20220145115-A1 | RESIN COMPOSITIONS AND METHODS OF PRODUCTION | MOMENTIVE PERFORMANCE MATERIALS INC. | 2022-05-12 | — | — | US | disclosed |
| US-11267955-B2 | Polymer network forming silane compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-03-08 | — | — | US | disclosed |
| US-4322476-A | Impact resistant laminate | GENERAL ELECTRIC COMPANY (US) | 1982-03-30 | — | — | US | disclosed |
| US-4288357-A | PARTIALLY HYDROLYZED SILICON COMPOUND AND A POLYOL | SUMITOMO CHEMICAL CO. LTD. (JP) | 1981-09-08 | — | — | US | disclosed |
| US-4242413-A | COATING WITH AN ORGANOSILOXANE PARTIAL HYDROLYSIS MIXTURE AND AN ACRYLIC ESTER COPOLYMER TO INSURE SMOOTHNESS AND IMPROVE ADHESION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-12-30 | — | — | US | disclosed |
| US-4224211-A | Heat curable coating compositions comprising partially hydrolyzed silicon compounds, acrylic copolymers and etherated methylolmelamine | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-09-23 | — | — | US | disclosed |
| US-4201832-A | SULFONATE; CROSSLINKED PRODUCT OF ALKOXYMETHYLMELAMINE, DIOL, AND POLYESTER OR POLYETHER | GENERAL ELECTRIC COMPANY (US) | 1980-05-06 | — | — | US | disclosed |
| US-4190699-A | WITH PARTIALLY HYDROLYZED SILICON COMPOUNDS AND ACRYLIC COPOLYMER FOLLOWED BY CURING | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1980-02-26 | — | — | US | disclosed |
| US-4028300-A | ACRYLIC COPOLYMERS, ETHERATED METHYLOLMELAMINE, AND PARTIAL HYDROLYZATES OF TETRAALKOXYSILANE AND AN ORGANIC SILICON COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-06-07 | — | — | US | disclosed |
| US-3960688-A | AMINOPLAST CROSSLINKING AGENT, POLYMER, AROMATIC SULFONIC ACID CATALYST | AMERICAN CYANAMID COMPANY (US) | 1976-06-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | MAPT 1634/4885SMN1; SMN2 4342/4885TSHR 2912/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | MAPT 3986/4885SMN1; SMN2 4809/4885TSHR 1292/4885 |
| US-20260015490-A1 | Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles | TST, RIF1, SORD | MAPT 2942/4885SMN1; SMN2 1513/4885TSHR 2223/4885 |
| US-20200140662-A1 | POLYMER NETWORK FORMING SILANE COMPOSITIONS | TSN, RIF1, TRHDE | MAPT 901/4885SMN1; SMN2 744/4885TSHR 2329/4885 |
| US-11267955-B2 | Polymer network forming silane compositions | TSN, RIF1, TRHDE | MAPT 901/4885SMN1; SMN2 744/4885TSHR 2329/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.