Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20752 | 0.95 | — | — | |
| SCHEMBL9501082 | 0.95 | — | — | |
| SCHEMBL1505903 | 0.90 | — | — | |
| SCHEMBL16165910 | 0.90 | — | — | |
| Ammonia Solution, Strong SCHEMBL9183430 | 0.90 | — | — | |
| SCHEMBL10320028 | 0.90 | — | — | |
| SCHEMBL16671452 | 0.90 | — | — | |
| SCHEMBL2734527 | 0.90 | — | — | |
| SCHEMBL18886747 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL8182468 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1656255-B | Acid plating bath and method for the electolytic deposition of satin nickel deposits | ATOTECH DEUTSCHLAND GMBH | 2010-06-16 | — | — | CN | claimed |
| EP-1513967-B1 | ACID PLATING BATH AND METHOD FOR THE ELECTOLYTIC DEPOSITION OF SATIN NICKEL DEPOSITS | ATOTECH DEUTSCHLAND GMBH (DE) | 2009-07-01 | — | — | EP | claimed |
| US-7361262-B2 | Acid plating bath and method for the electrolytic deposition of satin nickel deposits | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-04-22 | — | — | US | claimed |
| CN-1656255-A | Acid plating bath and method for the electolytic deposition of satin nickel deposits | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-08-17 | — | — | CN | claimed |
| US-20050150774-A1 | Contains quarternary ammonium compound and polyether with strongly hydrophobic side chain; long periods of operation or heating and cooling cycles; gloss finish; reduced sensitivity to wetting agents | ATOTECH DEUTSCHLAND GMBH & CO. KG (F/K/A ATOTECH DEUTSCHLAND GMBH) (DE) | 2005-07-14 | — | — | US | claimed |
| EP-1513967-A2 | ACID PLATING BATH AND METHOD FOR THE ELECTOLYTIC DEPOSITION OF SATIN NICKEL DEPOSITS | ATOTECH Deutschland GmbH (DE) | 2005-03-16 | — | — | EP | claimed |
| WO-2003100137-A2 | ACID PLATING BATH AND METHOD FOR THE ELECTOLYTIC DEPOSITION OF SATIN NICKEL DEPOSITS | ATOTECH DEUTSCHLAND GMBH (DE) | 2003-12-04 | — | — | WO | claimed |
| CN-113710329-B | Personal care compositions | 高露洁-棕榄公司 | 2024-04-05 | — | — | CN | disclosed |
| CN-102961266-B | Skin surface paint and greasy dirt isolation film and preparation method thereof | LARRY XIAMEN TECHNOLOGY CO LTD | 2014-07-02 | — | — | CN | disclosed |
| CN-102961266-A | Skin surface paint and greasy dirt isolation film and preparation method thereof | LARRY XIAMEN TECHNOLOGY CO LTD | 2013-03-13 | — | — | CN | disclosed |
| US-20120134947-A1 | ANTIPERSPIRANT COMPOSITIONS AND PRODUCTS HAVING COOLING SENSATION EFFECTS AND METHODS FOR MAKING THE SAME | THE DIAL CORPORATION (US) | 2012-05-31 | — | — | US | disclosed |
| US-20120135056-A1 | ANTIPERSPIRANT COMPOSITIONS AND PRODUCTS HAVING PREDETERMINED EFFECTS AND METHODS FOR MAKING THE SAME | THE DIAL CORPORATION (US) | 2012-05-31 | — | — | US | disclosed |
| US-8048406-B2 | Antiperspirant | THE DIAL CORPORATION (US) | 2011-11-01 | — | — | US | disclosed |
| US-20020155077-A1 | Personal care product | Henkel IP & Holding GmbH (DE) | 2002-10-24 | — | — | US | disclosed |
| EP-1082387-A1 | EMULSION RUBBER MIXTURES CONTAINING HYDROPHOBIC-RENDERED OXIDE OR SILICATE TYPE FILLERS AND THEIR USE FOR PRODUCING TIRES | BAYER AG (DE) | 2001-03-14 | — | — | EP | disclosed |
| EP-0952185-A1 | Compositions containing rubbers and activated and hydrophobised oxidic and siliceous fillers and process for preparation | BAYER AG (DE) | 1999-10-27 | — | — | EP | disclosed |
| WO-1999051673-A1 | EMULSION RUBBER MIXTURES CONTAINING HYDROPHOBIC-RENDERED OXIDE OR SILICATE TYPE FILLERS AND THEIR USE FOR PRODUCING TIRES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-10-14 | — | — | WO | disclosed |
| EP-0890600-A1 | Process for preparing rubber compositions with fillers | BAYER AG (DE) | 1999-01-13 | — | — | EP | disclosed |
| US-5817302-A | POLYSILSESQUISILOXANES, COSMETICS | GENERAL ELECTRIC COMPANY (US) | 1998-10-06 | — | — | US | disclosed |
| US-5684112-A | Low viscosity organofunctionalized siloxysilicates and cosmetic formulations therewith | GENERAL ELECTRIC COMPANY (US) | 1997-11-04 | — | — | US | disclosed |