Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28057083 | 0.94 | — | — | |
| SCHEMBL21951384 | 0.94 | — | — | |
| SCHEMBL198232 | 0.94 | — | — | |
| Water SCHEMBL17602750 | 0.89 | — | — | |
| Water SCHEMBL7867 | 0.88 | — | — | |
| SCHEMBL16782937 | 0.88 | — | — | |
| Water SCHEMBL4625950 | 0.88 | — | — | |
| Water SCHEMBL3173119 | 0.88 | — | — | |
| Water SCHEMBL1136940 | 0.88 | — | — | |
| Water SCHEMBL828809 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119491213-A | Microsphere surface chemical nickel plating method based on double reduction system | 安徽中科元贞科技有限责任公司 | 2025-02-21 | — | — | CN | claimed |
| CN-118946123-A | Preparation method of porous wave-absorbing material, porous wave-absorbing material and wave-absorbing device | 深圳市信维通信股份有限公司 | 2024-11-12 | — | — | CN | claimed |
| CN-117181001-A | Metal material coating film and preparation method thereof | 上海绅珑新材料科技有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-114457325-B | Nickel layer thickness control method for nickel-plated high polymer microspheres | 安徽中科元贞科技有限责任公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116770280-A | Preparation method of nickel-plated microsphere with controllable surface roughness | 安徽中科元贞科技有限责任公司 | 2023-09-19 | — | — | CN | claimed |
| CN-114457325-A | Method for controlling thickness of nickel layer of nickel-plated polymer microsphere | 安徽中科元贞科技有限责任公司 | 2022-05-10 | — | — | CN | claimed |
| JP-10147882-A | — | — | None | — | — | JP | disclosed |
| CN-119119409-B | Fireproof heat-insulating polyurethane microporous rubber and preparation method and application thereof | 蚌埠壹石通聚合物复合材料有限公司 | 2025-03-04 | — | — | CN | disclosed |
| CN-119491213-A | Microsphere surface chemical nickel plating method based on double reduction system | 安徽中科元贞科技有限责任公司 | 2025-02-21 | — | — | CN | disclosed |
| CN-119119409-A | Fireproof heat-insulating polyurethane microporous rubber and preparation method and application thereof | 蚌埠壹石通聚合物复合材料有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-118946123-A | Preparation method of porous wave-absorbing material, porous wave-absorbing material and wave-absorbing device | 深圳市信维通信股份有限公司 | 2024-11-12 | — | — | CN | disclosed |
| CN-117816208-A | Ni-based catalyst for preparing hexamethylenediamine by reductive amination of hexanediol and preparation method thereof | 中国科学院长春应用化学研究所 | 2024-04-05 | — | — | CN | disclosed |
| CN-117181001-A | Metal material coating film and preparation method thereof | 上海绅珑新材料科技有限公司 | 2023-12-08 | — | — | CN | disclosed |
| CN-1313641-C | Method for chemical plating nickel phosphor alloy | UNIV NANKAI (CN) | 2007-05-02 | — | — | CN | disclosed |
| JP-2001302219-A | METHOD FOR PRODUCING NICKEL HYPOPHOSPHITE | TANAKA ENG KK | 2001-10-31 | — | — | JP | disclosed |
| JP-2001287902-A | METHOD FOR PRODUCING NICKEL HYPOPHOSPHITE | TANAKA ENG KK | 2001-10-16 | — | — | JP | disclosed |
| US-6245389-B1 | USING PLATING SOLUTION OF NICKEL HYPOPHOSPHITE | NIPPON CHEMICAL INDUSTRIAL CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6030593-A | ION EXCHANGING A NICKEL SALT AND HYPOPHOSPHOROUS ACID | CECA S.A. (FR) | 2000-02-29 | — | — | US | disclosed |
| CN-1198723-A | Preparation method of nickel hypophosphite | CECA SA (FR) | 1998-11-11 | — | — | CN | disclosed |
| JP-H10147882-A | ELECTROLESS NICKEL PLATING SOLUTION | NIPPON CHEM IND CO LTD | 1998-06-02 | — | — | JP | disclosed |