Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL273748 | 1.00 | — | — | |
| Water SCHEMBL4235154 | 1.00 | — | — | |
| Water SCHEMBL2445961 | 1.00 | — | — | |
| Water SCHEMBL2848521 | 0.91 | — | — | |
| SCHEMBL162891 | 0.89 | — | — | |
| SCHEMBL1116296 | 0.80 | — | — | |
| Water SCHEMBL679671 | 0.80 | — | — | |
| SCHEMBL3623771 | 0.80 | — | — | |
| Potassium SCHEMBL1227920 | 0.80 | — | — | |
| Ammonia Solution, Strong SCHEMBL1313071 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230009052-A1 | STRUCTURED CATALYST FOR OXIDATION FOR EXHAUST GAS PURIFICATION, METHOD FOR PRODUCING SAME, AUTOMOBILE EXHAUST GAS TREATMENT DEVICE, CATALYTIC MOLDING, AND GAS PURIFICATION METHOD | FURUKAWA ELECTRIC CO., LTD. (JP) | 2023-01-12 | — | — | US | disclosed |
| US-11547987-B2 | Structured catalyst for oxidation for exhaust gas purification, method for producing same, automobile exhaust gas treatment device, catalytic molding, and gas purification method | FURUKAWA ELECTRIC CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| US-20200114339-A1 | STRUCTURED CATALYST FOR OXIDATION FOR EXHAUST GAS PURIFICATION, METHOD FOR PRODUCING SAME, AUTOMOBILE EXHAUST GAS TREATMENT DEVICE, CATALYTIC MOLDING, AND GAS PURIFICATION METHOD | FURUKAWA ELECTRIC CO., LTD. (JP) | 2020-04-16 | — | — | US | disclosed |
| EP-3632554-A1 | OXIDATION CATALYST STRUCTURE FOR EXHAUST GAS PURIFICATION AND PRODUCTION METHOD THEREOF, EXHAUST GAS TREATMENT DEVICE FOR VEHICLE, CATALYST MOLDED BODY, AND GAS PURIFICATION METHOD | Furukawa Electric Co., Ltd. (JP) | 2020-04-08 | — | — | EP | disclosed |
| US-8574676-B2 | Substrate processing method | NATIONAL UNIVERSITY CORPORATION NAGAOKA UNIVERSITY OF TECHNOLOGY (JP) | 2013-11-05 | — | — | US | disclosed |
| US-20110247560-A1 | SUBSTRATE PROCESSING APPARATUS | TOKYO ELECTRON LIMITED (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20110229637-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS | National University Corporation Nagaoka University Technology (JP) | 2011-09-22 | — | — | US | disclosed |
| US-7901866-B2 | Pattern forming method | CANON KABUSHIKI KAISHA (JP) | 2011-03-08 | — | — | US | disclosed |
| US-20100323108-A1 | DEPOSITION APPARATUS AND DEPOSITION METHOD | NATIONAL UNIVERSITY CORPORATION NAGAOKA UNIVERSITY OF TECHNOLOGY (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20090311633-A1 | PATTERN FORMING METHOD | CANON KABUSHIKI KAISHA (JP) | 2009-12-17 | — | — | US | disclosed |
| WO-2008047817-A1 | PATTERN FORMING METHOD | CANON KABUSHIKI KAISHA (JP) | 2008-04-24 | — | — | WO | disclosed |