Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NUDT1 | P36639 | 1/20 | 0.39 |
| ▸ | BACE1 | P56817 | 1/20 | 0.39 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | IDH1 | O75874 | 2/20 | 0.34 |
| ▸ | ESR1 | P03372 | 3/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.33 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.33 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8141767 | 0.91 | NUDT1 (0.40) | NUDT1BACE1ESR1ESR2HSPA5 | |
| SCHEMBL4061548 | 0.90 | NUDT1 (0.44) | NUDT1BACE1CYP2C9ESR1ESR2 | |
| SCHEMBL8150872 | 0.88 | NUDT1 (0.34) | NUDT1BACE1AMY1ACYP2C9CYP2C19 | |
| SCHEMBL8142256 | 0.88 | NUDT1 (0.40) | NUDT1BACE1ESR1ESR2NPC1 | |
| SCHEMBL27946352 | 0.88 | AMY1A (0.38) | NUDT1BACE1AMY1ACYP2C9CYP2C19 | |
| SCHEMBL8142469 | 0.88 | NUDT1 (0.39) | NUDT1BACE1ESR1ESR2HSPA5 | |
| SCHEMBL2386130 | 0.88 | SHBG (0.43) | NUDT1BACE1CYP2C9CYP2C19ESR1 | |
| SCHEMBL27946351 | 0.88 | NUDT1 (0.51) | NUDT1BACE1AMY1ACYP2C9CYP2C19 | |
| SCHEMBL9445214 | 0.87 | NUDT1 (0.43) | NUDT1BACE1AMY1ASMN1; SMN2PSMB5 | |
| SCHEMBL8150433 | 0.87 | OPRM1 (0.38) | NUDT1BACE1AMY1ACYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| EP-1614005-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-01-11 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| WO-2004088424-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-118295211-A | Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board | 深圳市容大感光科技股份有限公司 | 2024-07-05 | — | — | CN | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-6177226-B1 | PROVIDES A CONTACT HOLE PATTERN IMAGE HAVING LESS DIMPLES AND BEING IN EXACT ACCORDANCE WITH A MASK PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-01-23 | — | — | US | disclosed |
| US-6127087-A | COMPOSITION COMPRISING ALKALI-SOLUBLE RESIN, SPECIFIED QUINONEDIAZIDE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6120969-A | PHENOLIC RESINS FOR PHOTORESISTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-09-19 | — | — | US | disclosed |
| US-6106994-A | ESTERIFYING A POLYPHENOL COMPOUND AND NAPHTHOQUINONE-1,2-DIAZIDESULFONYL HALIDE IN THE PRESENCE OF FOR EXAMPLE MONOMETHYLDICYCLOHEXYLAMINE, AND POSITIVE PHOTOSENSITIVE COMPOSITION CONTAINS RESULTANT ESTER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |