SCHEMBL23870871

SCHEMBL23870871

CC(I)C(=O)OCCN(CCO)CCO

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 3/20 0.38
CHRNA4 P43681 3/20 0.38
CHRNB4 P30926 2/20 0.38
CHRNA3 P32297 2/20 0.38
LMNA P02545 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.35
ALDH1A1 P00352 1/20 0.35
CYP3A4 P08684 1/20 0.35
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM5 P08912 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
SCN5A Q14524 1/20 0.31
SCN9A Q15858 1/20 0.31
SCN10A Q9Y5Y9 1/20 0.31
KDM4E B2RXH2 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23867004 0.92 CYP2D6 (0.40) CHRNB2CHRNA4CHRNB4CHRNA3LMNA
SCHEMBL25142186 0.86 CYP2D6 (0.37) CHRNB2CHRNA4LMNACYP1A2CYP2D6
SCHEMBL26082946 0.83 CHRNB2 (0.37) CHRNB2CHRNA4CHRNB4CHRNA3CHRM2
SCHEMBL23870850 0.82 CYP2D6 (0.47) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1
SCHEMBL26784166 0.82 CYP2D6 (0.51) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1
SCHEMBL23870697 0.81 CHRM2 (0.41) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1
SCHEMBL26784393 0.81 HSD17B10 (0.44) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1
SCHEMBL26784823 0.81 CHRNB2 (0.38) CHRNB2CHRNA4CHRNB4CHRNA3LMNA
SCHEMBL23870696 0.80 CYP1A2 (0.36) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1
SCHEMBL23871230 0.80 CHRM2 (0.42) LMNACYP1A2CYP2D6SMN1; SMN2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed