SCHEMBL26784393

SCHEMBL26784393

CC(I)C(=O)OCCOCCN(CCOCCOC(=O)C(C)I)CCOCCOC(=O)C(C)I

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.44
BLM P54132 1/20 0.44
PMP22 Q01453 1/20 0.44
KDM4E B2RXH2 2/20 0.43
CA1 P00915 3/20 0.34
CA2 P00918 3/20 0.34
CA12 O43570 1/20 0.34
CA9 Q16790 1/20 0.34
ALDH1A1 P00352 5/20 0.34
CHRM2 P08172 4/20 0.34
CHRM1 P11229 4/20 0.34
TSHR P16473 4/20 0.34
LMNA P02545 2/20 0.34
CYP1A2 P05177 2/20 0.34
CYP2D6 P10635 2/20 0.34
CYP3A4 P08684 2/20 0.34
SLC22A1 O15245 1/20 0.34
THRB P10828 1/20 0.34
PRCP P42785 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142624 0.95 KDM4E (0.40) HSD17B10BLMPMP22KDM4ECA1
SCHEMBL23867004 0.88 CYP2D6 (0.40) HSD17B10BLMPMP22ALDH1A1CHRM2
SCHEMBL23870844 0.84 BLM (0.39) HSD17B10BLMPMP22KDM4ECA1
SCHEMBL25142186 0.82 CYP2D6 (0.37) ALDH1A1CHRM2CHRM1TSHRLMNA
SCHEMBL3137072 0.81 TSHR (0.33) ALDH1A1TSHR
SCHEMBL23870871 0.81 CHRNB2 (0.38) KDM4EALDH1A1CHRM2CHRM1LMNA
SCHEMBL23871230 0.80 CHRM2 (0.42) KDM4EALDH1A1CHRM2CHRM1LMNA
SCHEMBL23870936 0.78 ALDH1A1 (0.33) HSD17B10ALDH1A1TSHRTP53HIF1A
SCHEMBL23870850 0.78 CYP2D6 (0.47) BLMKDM4EALDH1A1CHRM2CHRM1
SCHEMBL26784166 0.78 CYP2D6 (0.51) BLMKDM4EALDH1A1CHRM2CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed