SCHEMBL23870932

SCHEMBL23870932

CC(I)C(=O)OCC1CCN(C)CC1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HTR4 Q13639 1/20 0.39
NCF1 P14598 1/20 0.38
HDAC1 Q13547 3/20 0.38
HDAC2 Q92769 3/20 0.38
HDAC3 O15379 2/20 0.38
KDM1A O60341 1/20 0.36
CHRM3 P20309 4/20 0.36
CARM1 Q86X55 1/20 0.35
PRMT6 Q96LA8 1/20 0.35
ACHE P22303 2/20 0.35
BCHE P06276 3/20 0.34
GNAI3 P08754 1/20 0.34
GNAO1 P09471 1/20 0.34
GNAI1 P63096 1/20 0.34
MAOB P27338 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19765231 0.86 NCF1 (0.41) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL19651224 0.83 NCF1 (0.42) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL882324 0.82 HDAC1 (0.38) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL25142026 0.82 CHRNB2 (0.48) HDAC1HDAC2CHRM3ACHEBCHE
SCHEMBL26785169 0.81 HTR4 (0.40) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL26296842 0.80 LMNA (0.49)
SCHEMBL4765091 0.80 CARM1 (0.39) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL21578753 0.79 HDAC1 (0.38) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL1813937 0.79 CHRM3 (0.43) HTR4NCF1HDAC1HDAC2HDAC3
SCHEMBL16844987 0.78 NCF1 (0.43) HTR4NCF1HDAC1HDAC2HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed