SCHEMBL23907104

SCHEMBL23907104

Cc1cc(OC2CCCCO2)cc(C)c1OC1CCCCO1

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
DHFR P00374 1/20 0.37
HSD11B1 P28845 1/20 0.36
KDM4C Q9H3R0 1/20 0.35
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TNK2 Q07912 3/20 0.32
PDE4B Q07343 2/20 0.32
PTPN1 P18031 2/20 0.31
SLC6A3 Q01959 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25633066 0.91 DHFR (0.34) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL563008 0.85 HSD11B1 (0.38) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL23907118 0.85 HSD11B1 (0.38) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL16406637 0.83 HPGD (0.39) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL29311949 0.81 PDE4B (0.38) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL23907117 0.80 HSD11B1 (0.35) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL23906803 0.80 DHFR (0.37) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL3451372 0.78 HSD11B1 (0.43) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL6680451 0.78 HSD11B1 (0.43) DHFRHSD11B1KDM4CNPC1RAB9A
SCHEMBL30900827 0.78 HSD11B1 (0.43) DHFRHSD11B1KDM4CNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed