SCHEMBL23907117

SCHEMBL23907117

Cc1cc(OC2CCCCO2)cc(I)c1O

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.35
MAOA P21397 1/20 0.35
DHFR P00374 1/20 0.34
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TNK2 Q07912 2/20 0.32
PTPN1 P18031 1/20 0.32
KDM4C Q9H3R0 1/20 0.32
PDE4B Q07343 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
SLC6A3 Q01959 2/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
HIF1A Q16665 1/20 0.30
CYP4F2 P78329 1/20 0.30
CYP4A11 Q02928 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907132 0.94 HSD11B1 (0.38) HSD11B1MAOADHFRMEN1KMT2A
SCHEMBL23907118 0.91 HSD11B1 (0.38) HSD11B1MAOADHFRMEN1KMT2A
SCHEMBL25633066 0.87 DHFR (0.34) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL23907104 0.80 DHFR (0.37) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL23906803 0.80 DHFR (0.37) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL563008 0.79 HSD11B1 (0.38) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL6680451 0.78 HSD11B1 (0.43) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL30900827 0.78 HSD11B1 (0.43) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL16406637 0.77 HPGD (0.39) HSD11B1DHFRMEN1KMT2ATNK2
SCHEMBL2023924 0.76 PTPN1 (0.38) HSD11B1DHFRMEN1KMT2APTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed