Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DHFR | P00374 | 1/20 | 0.37 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TNK2 | Q07912 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25633066 | 0.91 | DHFR (0.34) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL23907132 | 0.85 | HSD11B1 (0.38) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL22991658 | 0.81 | PTPN1 (0.33) | DHFR | |
| SCHEMBL23907117 | 0.80 | HSD11B1 (0.35) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL23907104 | 0.80 | DHFR (0.37) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL7523611 | 0.78 | DHFR (0.40) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL23906802 | 0.77 | PTPN1 (0.35) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL3500438 | 0.76 | TNK2 (0.44) | DHFRKDM4CHSD11B1MEN1KMT2A | |
| SCHEMBL26084998 | 0.76 | DHFR (0.39) | DHFRKDM4CMEN1KMT2ATNK2 | |
| SCHEMBL16406637 | 0.76 | HPGD (0.39) | DHFRKDM4CHSD11B1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-11675267-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20210311392-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-10-07 | — | — | US | disclosed |