SCHEMBL23907136

SCHEMBL23907136

CC(Oc1ccc(Oc2ccc(OC(C)OC3CCCCC3)cc2)cc1)OC1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
SMN1; SMN2 Q16637 4/20 0.38
NPC1 O15118 1/20 0.38
HPGD P15428 1/20 0.38
RAB9A P51151 1/20 0.38
NPSR1 Q6W5P4 2/20 0.36
ALOX12 P18054 1/20 0.34
NPY5R Q15761 1/20 0.34
MEN1 O00255 1/20 0.33
MITF O75030 1/20 0.33
KMT2A Q03164 1/20 0.33
MMP2 P08253 1/20 0.33
MMP3 P08254 1/20 0.33
MMP9 P14780 1/20 0.33
MMP14 P50281 1/20 0.33
MMP13 P45452 1/20 0.33
PTGS1 P23219 1/20 0.33
PTGS2 P35354 1/20 0.33
CYP19A1 P11511 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907140 0.92 MEN1 (0.42) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL15984209 0.88 MEN1 (0.41) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL6761927 0.86 KMT2A (0.37) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL16429329 0.86 ALDH1A1 (0.38) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL17039860 0.86 NPSR1 (0.47) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL18120342 0.86 CHRNB4 (0.45) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL23907145 0.85 SMN1; SMN2 (0.36) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL23907146 0.85 LTA4H (0.41) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL11125523 0.84 KDM4E (0.38) KDM4EALDH1A1SMN1; SMN2NPC1HPGD
SCHEMBL14583743 0.83 KMT2A (0.36) KDM4EALDH1A1SMN1; SMN2NPC1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed