SCHEMBL23907145

SCHEMBL23907145

CC(Oc1ccc(Sc2ccc(OC(C)OC3CCCCC3)cc2)cc1)OC1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 6/20 0.36
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
CHRM2 P08172 1/20 0.35
CHRM1 P11229 1/20 0.35
PTGIR P43119 2/20 0.35
NPSR1 Q6W5P4 3/20 0.34
MEN1 O00255 1/20 0.32
MITF O75030 1/20 0.32
KMT2A Q03164 1/20 0.32
LMNA P02545 1/20 0.31
PTGS1 P23219 1/20 0.31
PTGS2 P35354 1/20 0.31
CYP19A1 P11511 1/20 0.31
GAA P10253 1/20 0.31
BCHE P06276 1/20 0.30
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907142 0.93 NR1H2 (0.39) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL13154068 0.88 KDM4E (0.35) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL23907136 0.85 KDM4E (0.39) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL15984209 0.83 MEN1 (0.41) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL6761927 0.82 KMT2A (0.37) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL17039860 0.82 NPSR1 (0.47) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL16429329 0.82 ALDH1A1 (0.38) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL18120342 0.81 CHRNB4 (0.45) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL23907146 0.81 LTA4H (0.41) SMN1; SMN2KDM4EALDH1A1HPGDNPC1
SCHEMBL11125523 0.80 KDM4E (0.38) SMN1; SMN2KDM4EALDH1A1HPGDNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed